MATERIALS ANALYSIS I

EXERCISES

SEM2SCANNINGELECTRONMICROSCOPY:FURTHERTECHNIQUES

The lecture focuses on different analytical techniques that are applied, in combination with scanning electron microscopy, for the analysis of materials. It will discuss the electronbeam induced current mode (EBIC) and the cathodoluminescence (CL) mode and present examples of applications to the characterizationofthepropertiesofmaterials. 1. Introduction. Motivation: surface imaging, scanning beam techniques, SEM in development and fabricationofdevices.Needforinformationaboutstructuralandelectronicproperties. 2. Electronbeamspecimeninteraction.Interactionvolume,secondaryeffects,energydistributionof emitted electrons, formation of charge carriers in semiconductors and insulators, electrical chargingofspecimens.Electricaljunctions(pn). 3. Instrumental aspects. Short summary of main components of SEM (electron sources, lenses, deviation andfocusingofelectron beams,detectors).Additionofdetectorsforspectroscopy and lightdetection. 4. Electron beam induced current (EBIC), charge collection (CC) mode: experimental setup, CC current, CC collection and efficiency, discussion of various cases. Applications to semiconductor technology:measurementofdiffusionlengthsofminoritycarriers,analysesofpnjunctions. 5. Cathodoluminescence(CL) inSEM:generationofchargecarriers,recombinationprocess,intrinsic and extrinsic cathodoluminescence, exciton transitions, intensity of emitted light, detectors, integralandspectrallyresolvedmeasurement.Applicationsintechnology,ingeology,. 6. Applicationsinsemiconductortechnology(processcontrol,failureanalysis,devicecharacterization) andinotherareas. 7. Summary.
Remark: ThefocusoftheSEM1groupisondiscussionofimagingmodesandtypesofimagecontrast,includingbasicsonsecondary(SE) and backscatter (BS) electrons (dependence on energy and on atomic number Z), orientation characteristics and contrast formation,detectionofSEandBSelectronsanddetectors,SEandBSimagingmodesandrelatedcontrastformation(orientation contrast,materialorZcontrast,potentialcontrast,magneticcontrast).

References
1. 2. 3. E.Fuchs,H.Oppolzer,H.Rehme,ParticleBeamMicroanalysisFundamentals,MethodsandApplicationsVCH1990 MaterialsScienceandTechnology,Eds.R.W.Cahn,P.Haasen,E.J.KramerVol.2ACharacterizationofMaterialsCh.3 L.ReimerScanningElectronMicroscopySpringer1995

Pleasefindalsoexamplesofapplicationsintheinternet.

ma mikrostrukturanalytik

Prof. Dr. Wolfgang Jger

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