Introduction
Plan
recent results
SILS School on SR, Duino (Trieste), Italy, September 2011
Energy
2p
2s
1s
EXAFS
Extended X-ray Absorption Fine Structure
When applicable, fit with the standard EXAFS
equation
From ab-initio calculations or from reference compounds
(k ) = S
2
0
A j (k ) Sin[2krj + j + 21 ] e
2 k 2 2j
j = shells
Measure:
2m(h E B )
k=
h
Coordination
number
Interatomic
distance
XANES
X-ray Absorption Near Edge Structure
(also NEXAFS)
r
2
(h ) = 4 h i r f
(E f )
l = 1, ml = 0
(lin. pol. light)
Characteristics of XAFS
Growth
Structure
MBE@TASC
XAFS
Todays topics
Dopants, defects
Alloys
local distortions
ordering
Phase transitions
Thin films, interfaces
Nanostructures
Semiconductor dots
Metallic clusters
SILS School on SR, Duino (Trieste), Italy, September 2011
Si in GaAs
S. Schuppler, D.L. Adler, L.N. Pfeiffer, K.W. West, E.E. Chaban,
and P.H. Citrin, Appl. Phys. Lett. 63, 2357 (1993) and Phys. Rev. B 51, 10527 (1995)
Si common dopant
in GaAs
Si:GaAs exhibits
deactivation
Accepted explanation :
amphoteric nature of Si
SiGa (Si in Ga site): donor
SiAs: acceptor
At low concentration all SiGa, at higher concentrations both:
autocompensation
Si in GaAs: XANES
Samples studied
Increasing [Si]
Si:GaAs(001)
at low concentration SiGa
Si:GaAs(311)A
at low concentration SiAs
XANES exhibit
reasonable evolution
with concentration
Difference in lineshape
between SiGa and SiAs
due to difference in
charge on Si and
conduction band DOS
Si in GaAs: XANES
Fitting of Very High
concentration sample
indicated that
lineshape cannot be
explained only on the
basis of combination
of SiGa and SiAs
Si in GaAs : EXAFS
Compare EXAFS spectra
with those of SixGe1-x
random alloys
Ge has similar scattering
amplitude to Ga and As
VH sample spectrum very
similar to Si0.2Ge0.8
20% of Si is bonded to Si
Conclusion: deactivation
due also to presence of
Si dimers and clusters
Fe in GaN
A. Bonanni, A. Navarro-Quezada, Tian Li, M. Wegscheider, Z. Matj, V. Hol, R. T. Lechner, G. Bauer, M. Rovezzi,
F. DAcapito, M. Kiecana, M. Sawicki, and T. Dietl, Phys. Rev. Lett. 101, 135502 (2008)
M. Rovezzi, F. DAcapito, A. Navarro-Quezada, B. Faina, T. Li, A. Bonanni, F. Filippone, A. Amore Bonapasta,
and T. Dietl, Phys. Rev. B 79, 195209 (2009)
A. Navarro-Quezada, W. Stefanowicz, Tian Li, B. Faina, M. Rovezzi, R. T. Lechner, T. Devillers, F. DAcapito,
G. Bauer, M. Kiecana, M. Sawicki, T. Dietl, and A. Bonanni Phys. Rev. 81, 205206 (2010)
Fe:GaN data
Increasing Fe
Low Fe content:
only two Fe-N (R1) and
Fe-Ga (R3) bonds.
Fe substitutional; bond
length in agreement with
DFT for Fe3+
High Fe content
Appearance of Fe-Fe
(R2) coming from a
precipitated FexN phase
Increasing Fe
Si,Fe:GaN data
For the same Fe
content Si co-doping
prevents the
formation of Fe3N
No evidence of the
Fe-Fe bond at R2
Si
~ 10 m oxide
21
SILS School on SR, Duino (Trieste), Italy, September 2011
FluorescenceYield
10
10
-1
10
-2
K edge yield
L edge yield
III
10
-3
L edges
K edges
10
III
-4
10
15
20
25
30
Z
SILS School on SR, Duino (Trieste), Italy, September 2011
Eg (eV)
GaN
3.25 eV
GaAs
1.42 eV
0.0
0.5
y
1.0
X-ray diffraction
EK~100 eV
GaAsN
GaAs
photoluminescence
G. Ciatto, F. Boscherini, A. Amore Bonapasta, F. Filippone, A. Polimeni and M. Capizzi, Phys. Rev. B
71, 201301 (2005)
M. Berti, G. Bisognin, D. De Salvador, E. Napolitani, S. Vangelista, A. Polimeni, M. Capizzi,
F. Boscherini, G. Ciatto, S. Rubini, F. Martelli, and A. Franciosi, Phys. Rev. B 76, 205323 (2007)
G. Ciatto, F. Boscherini, A. Amore Bonapasta, F. Filippone, A. Polimeni, M. Capizzi, M. Berti,
G. Bisognin, D. De Salvador, L. Floreano, F. Martelli, S. Rubini, and L. Grenouillet, Phys. Rev. B 79,
165205 (2009)
DFT calculations to
determine lowest energy
geometries
Full multiple scattering
XANES simulations
Answer: C2v like
complexes are mostly
present
3-D sensitivity of
XANES!!
Absorption cross-section
As grown
N-H
BC
N-H
3
C
2v
Hydrogenated
Semiconductor alloys
For example:
InxGa1-xAs
Alloying leads to
changes in
band-gap
lattice parameter
Lattice parameter ()
GaAs
In0.5Ga0.5As
ij
(Cos
ijk
ijk
+ 13 ) 2
Ga1xInxP alloys
C. S. Schnohr, L. L. Araujo, P. Kluth,
D. J. Sprouster, G. J. Foran, and
M. C. Ridgway, Phys. Rev. 78, 115201
(2008)
26 years later
Much better data
More sophisticated
analysis
Same conclusion!
SL
Fe
S
Sr
O
Mo
0.9
0.8
0.5
A = Fe sublattice
B = Mo sublattice
0.4
0.2
x = N(FeA)/N(Fe)
S = 2x - 1
Defect clusters
S = 0.51
Antiphase regions
Fe on Mo lattice
Mo on Fe lattice
S takes into account only for the number of Anti Site defects (FeB or MoA),
not their arrangement
SILS School on SR, Duino (Trieste), Italy, September 2011
0.9
0.8
0.5
0.4
0.2
fitted
random
SILS School on SR, Duino (Trieste), Italy, September 2011
EXP
random
=0.63=S2 S=0.51
=0.85 S=0.51
1.5 nm
=0.99 S=0.51
low temp
c
XRD
c: sum of R(Ti-O1)
a: calculated from R(Ti-O2)
Conclusion
local distortions survive above Tc
Above Tc random orientation of
domains with permanent dipole
moment
Phase change in GST is fast and stable because the process does
not require rupture of strong bonds or diffusion
Amorphous
marks
As-deposited
amorphous
GaN
CUBIC
HEXAGONAL
Katsikini et. al., APL 69, 4206 (1996); JAP 83, 1440 (1998)
Pentacene on Au(110)
Bavdek et al., Langmuir 24, 767 (2008)
C K edge XANES
Transitions to *
molecular orbitals give
rise to strong peak
Pentacene on Au(110)
Marked dependence of * feature on orientation
At high coverage persistence of peak when beam
along (1 -1 0) direction
Pentacene on Au(110)
heating up to TN
FM
+
cooling in H
AFM
exchange bias
Fe
FM
TC=1040 K
m= - 2.8%
aFe= 2.866
dFe = 4.053 rock-salt
NiO
AF
TN=520 K
aNiO= 4.176
SILS School on SR, Duino (Trieste), Italy, September 2011
Fe/NiO XANES
deviation from
metallic character
shift of the
white line
towards FeO
k
E
Fe/NiO 2 ML thickness
Ge Quantum Dots
F. Boscherini, G. Capellini, L. Di Gaspare, F. Rosei,
N. Motta, and S. Mobilio, Appl. Phys. Lett. 76, 682 (2000)
Contributions from:
strain
surface
dislocations
Wetting layer
- wetting layer
- islands
AFM of Ge dots
100
Ge/Si(001)
80
60
40
20
0
0
5 10 15 20 25 30 35 40
-1
k (k) ( )
3
2
(001)
38 nm
Ge
0
2
8 10 12 14 16
-1
k ( )
Ge in Si
Ge Fou Transf
dots
Ge bulk
0
2
4
6
interatomic distance ()
Conventional SK growth
Metallic nanostructures
One of the first applications of XAFS
Exploits high resolution in first coordination
shells
R
2
= f
R
3 r
2
0j
2 k 2 2
r r
= (u0 u j ) R 0 j
Bulk Au
SILS School on SR, Duino (Trieste), Italy, September 2011
Conclusions
XAFS has been used to address important
structural issues in materials/nano science
It has specific advantages, especially
Atomic selectivity
Sensitivity to high dilutions & surfaces/interfaces
Equally applicable to ordered or disordered matter
EXAFS: high resolution for first few coordination shells
XANES:
valence/oxidation state
3D structural sensitivity
m spot size now available and decreasing fast
Time resolution in the 10 -100 ps range available and with FELs
decreasing to 10 fs
SILS School on SR, Duino (Trieste), Italy, September 2011