Organic Electronics
journal homepage: www.elsevier.com/locate/orgel
Department of Advanced Materials Chemistry, Korea University, Sejong 30019, South Korea
Department of Chemistry, Seoul Women's University, Seoul 01797, South Korea
a r t i c l e i n f o
a b s t r a c t
Article history:
Received 23 June 2015
Received in revised form
4 August 2015
Accepted 30 August 2015
Available online 25 September 2015
A series of electron transporting materials was designed and used in organic light-emitting diodes
(OLEDs), exhibiting green phosphorescence. We used the tetrahedral structural motif of silicon atom,
which annulated with the 1,2-diphenyl-benzoimidazole (DBI) units in its periphery (1e4) and their
thermal, photophysical, and electrochemical properties were investigated. Among the series, the X-ray
crystal structure of compound 1 was obtained and investigated. Photophysical and electrochemical
properties showed that their LUMO levels can be slightly tuned as increasing number of DBI units and
enhancing the electron injection capability. Furthermore, thermal stability correlated well with an increase in the number of DBI units, showing a gradual increase in Tg values in the range of 100e141 C. The
electron-only devices (EOD) based on compounds 2 and 3 were fabricated; EOD device with compound 3
showed higher current densities at the same voltages, indicating higher electron transport (ET) capability
compared to compound 2. The electron mobilities (m) of compounds 2 and 3 were estimated as
1.93 105 cm2/V and 3.67 105 cm2/V at 1 MV/cm, respectively. We further investigated the excellent
ET property of compound 3 via the phosphorescent OLEDs in which the electron-transporting material
(ETM) was coupled with the green emitter, Ir(ppy)3. Finally, we compared it with the device based on
compound 2. The OLEDs device with compound 3 exhibited maximum current and external quantum
efciencies of 62.8 cd/A and 18.0%, respectively, with a small efciency roll-off at high current densities.
2015 Elsevier B.V. All rights reserved.
Keywords:
Electron transporting material
High thermal stability
High triplet
1. Introduction
Researchers have focused their attention on developing organic
light-emitting diodes (OLEDs) of high efciency. OLEDs have
numerous practical applications, because they can be used in at
panel displays and lighting [1e4]. OLEDs devices hold signicant
importance because they have high emission efciency and
appreciable lifetime.
To achieve high efciency, charge carrier balance has to be
optimized [5,6]. However, hole mobility is usually much higher
than electron mobility in OLEDs. As a result, the efciency of OLEDs
is drastically reduced [7e9]. Thus, several methodologies have been
* Corresponding author.
** Corresponding author.
*** Corresponding author.
E-mail addresses: wshan@swu.ac.kr (W.-S. Han), hjson@korea.ac.kr (H.-J. Son),
sangok@korea.ac.kr (S.O. Kang).
http://dx.doi.org/10.1016/j.orgel.2015.08.029
1566-1199/ 2015 Elsevier B.V. All rights reserved.
benzoimidazole (DBI) unit into the silicon atom may give a synergetic effect toward highly efcient and stable ET material. In this
report, as shown in Chart 1, we designed and prepared 1,2diphenyl-benzoimidazole (DBI) derivatives (1e4), which exuded
high thermal stability, wide energy gap, and high electron mobility.
The single-crystal molecular structure, thermal and photophysical
properties, and ET capability of these compounds were systematically investigated. Thereafter, green PhOLEDs using 2 and 3 as ET
materials were fabricated and their efciencies are reported.
127
Me
Si
N
Me
N
Me
Me
Me
Si
N
Me
Si
Si
2. Experimental
2.1. General information
All the experimental procedures were carried out under a dry
nitrogen or argon atmosphere using standard Schlenk techniques.
Tetrahydrofuran (THF) was distilled freshly over sodium benzophenone. The 1H and 13C NMR spectra were recorded on a Varian
Mercury 300 spectrometer, which was operated at 300.1 and
75.4 MHz, respectively. 1H and 13C NMR chemical shifts were
measured in CDCl3 and referenced to relative peaks of CHCl3
(7.26 ppm for 1H NMR) and CDCl3 (77.16 ppm for 13C NMR). The
elemental analyses were conducted using a Carlo Erba Instruments
CHNSO EA 1108 analyzer. High resolution tandem mass spectrometry was performed using Jeol LTD JMS-HX 110/110A at the
Korean Basic Science Institute. Cyclic voltammetry (CV) was performed in an electrolytic solution prepared using 1 mM of electroactive compounds and 0.1 M tetrabutyl ammonium hexauorophosphate (NBu4PF6) at room temperature under an atmosphere of nitrogen. For this purpose, BAS 100B electrochemical
analyzer was used. Glassy carbon, platinum wire, and Ag/AgNO3
(0.1 M) were used as working, counter, and reference electrodes,
respectively. All the potentials were calibrated to the ferrocene/
ferrocenium (Fc/Fc) redox couple. n-BuLi (2.5 M solution in nhexane), trimethylchlorosilane, dimethyldichlorosilane, trichloromethylsilane, and tetrachlorosilane were purchased from
Aldrich and used in this experiment without further purication. 2(4-bromophenyl)-1-phenyl-1H-benzo[d] imidazole was synthesized according to the protocol mentioned in literature [17].
2.2. Synthesis
Compound 1 The solution of n-BuLi in 2.5 M n-hexane (2.64 mL,
6.6 mmol) was added dropwise to a solution of 2-(4-bromophenyl)1-phenyl-1H-benzo[d] imidazole (2.09 g, 6 mmol) in dry THF
(30 mL) at 78 C. At temperature of 78 C, the resulting reaction
mixture was stirred continuously. Thereafter, we slowly added trimethylchlorosilane (0.76 mL, 6 mmol) to the mixture. Then, the
reaction temperature was allowed to warm at room temperature
and stirred overnight. The reaction was quenched by adding water,
ArH), 7.43e7.54 (m, 2H, ArH), 7.31e7.36 (m, 3H, ArH), 7.25 (dd,
J 5.4 Hz, J 0.6 Hz, 2H, ArH), 0.25 (s, 9H, SieCH3). 13C NMR (CDCl3):
d152.4, 143.0, 142.3, 137.4, 137.1, 133.2, 130.1, 129.9, 128.6, 128.4,
127.5, 123.3, 123.0, 119.8, 110.4, 1.2. According to electrospray
ionization mass spectrometry (ESI-MS) technique, the calculated for
C22H22N2Si was 342.1552. Found: 342.1549. Calcd for C22H22N2Si: C,
77.15; H, 6.47; N, 8.18. Found: C, 77.12; H, 6.49; N, 8.17.
Compound 2 We used a procedure analogous to the one used in
the preparation of compound 1. In this case, dichlorodimethylsilane
was used as the starting material. After the reaction, the solvent
was removed and the residue was subjected to column chromatography (ethyl acetate/n-hexane, 1:5). Compound 2 was produced
as a white solid; the yield of this reaction was 72%. Before conducting device fabrication, 52% yield of pure compound 2 was obtained by train sublimation. 1H NMR (CDCl3) d 7.88 (dt, J 7.8 Hz,
0.9 Hz, 2H, ArH), 7.49e7.55 (m, 10H, ArH), 7.39e7.41 (m, 4H, ArH),
7.31e7.34 (m, 6H, ArH), 7.25e7.27 (m, 4H, ArH), 0.51 (s, 6H, SieCH3).
13
C NMR (CDCl3): d152.2, 143.0, 139.5, 137.4, 137.0, 134.1, 130.6,
129.9, 128.7, 128.5, 127.5, 123.4, 123.0, 119.9, 110.5, 2.6. According
to ESIeMS technique, calculated for C40H32N4Si was 596.2396.
Found: 596.2391. Calcd for C40H32N4Si: C, 80.50; H, 5.40; N, 9.39.
Found: C, 80.52; H, 5.41; N, 9.37.
Compound 3 We used a procedure analogous to the one used in
the preparation of compound 1 In this case, trichloromethylsilane
was used as the starting material. After the reaction, the solvent
was removed and the residue was subjected to column chromatography (ethyl acetate/n-hexane, 1:4), and compound 3 was obtained as a white solid. The yield of this reaction was 54%. For device
fabrication, compound 3 was further puried by train sublimation.
The yield of this reaction was 47% .1H NMR (CDCl3) d 7.88 (d,
J 7.8 Hz, 3H, ArH), 7.47e7.55 (m, 15H, ArH), 7.31e7.37 (m, 15H,
ArH), 7.22e7.27 (m, 6H, ArH), 0.78 (s, 3H, SieCH3). 13C NMR (CDCl3):
d152.0, 143.0, 137.4, 137.0, 136.9, 135.1, 131.0, 130.0, 128.8, 128.6,
127.4, 123.5, 119.9, 110.5, 3.8. The ESI-MS calculated for C58H42N6Si
was 850.3240. Found: 850.3244. Calcd for C58H42N6Si: C, 81.85; H,
4.97; N, 9.87. Found: C, 81.83; H, 4.99; N, 9.88.
Compound 4 The procedure used for synthesizing compound 4
was analogous to the one used in the preparation of compound 1. In
this case, tetrachlorosilane was used as the starting material. After
completion of the reaction, the solvent was recovered, and the
128
residue was subjected to column chromatography (ethyl acetate/nhexane, 1:1). Thus, we obtained pure compound 4 in the form of a
white solid. The yield of this reaction was 33%. However, we could
not perform train sublimation of compound 4 might be due to the
high molecular weight. 1H NMR (CDCl3) d 7.85e7.89 (m, 4H, ArH),
7.49e7.57 (m, 10H, ArH), 7.37e7.43 (m, 18H, ArH), 7.32e7.38 (m, 10H,
ArH), 7.20e7.28 (m, 10H, ArH). Owing to the low solubility of compound 4, 13C NMR could not be performed. The ESI-MS calculated for
C76H52N8Si was 1104.4084. Found: 1104.4088. Calcd for C76H52N8Si:
C, 82.58; H, 4.74; N, 10.14. Found: C, 82.61; H, 4.77; N, 10.12.
Fig. 1. ORTEP (III) [23] structure of compound 1 showing thermal ellipsoids; the
probability level of this structure is 30%. Hydrogen atoms were omitted for the purpose
of clarity.
The thermal stability of compounds 1e4 were investigated using the techniques of thermogravimetric analysis (TGA) and differential scanning calorimetry (DSC). The DSC experiments were
carried out at a temperature ranging from 30 to 430 C under an
atmosphere of nitrogen. In subsequent heating cycles, we observed
endothermic step transitions of weak intensity, corresponding to
compounds 2 and 3 in the DSC curve; the glass phase transition
temperature (Tg) of the compounds was determined from these
curves. For compounds 1 and 4, we could not observe endothermic
step transitions of well-dened nature. The thermal properties of
the derivatives, 2 and 3, increased in proportion to the number of
substituted DBI units at the silicon central atom, as shown in Fig. S1.
In the consecutive heating and cooling cycles, the glass phase
transition temperature, Tg, remained constant in the DSC thermogram. This indicates that the amorphous glass state of these compounds was highly stable. The glass-transition temperature of
compounds 2 and 3 are 100 and 141 C, respectively. Compounds 2
and 3 have excellent thermal stability, which could be ascribed to
the increase in their molecular size. In particular, the compound 3
showed higher thermal stability compared with carbon-based DBI
compound, TPBi (2-[3,5-bis(1-phenylbenzimidazol-2-yl)phenyl]-1phenylbenzimidazole, Tg 124 C) [24], and this higher Tg value of
compound 3 would gave advantages for the high morphologic
stability of the amorphous phase in a deposited lm, which is a
prerequisite for applications in OLEDs.
1.0
0.8
0.6
0.4
1 absorption
2 absorption
3 absorption
4 absorption
350
1 emission
2 emission
3 emission
4 emission
200
300
250
150
100
0.2
50
0.0
250
300
350
400
450
500
550
0
600
dened phosphorescence spectra, which were obtained after dissolving them in 2-methyl-tetrahydrofuran (2-MeTHF) at 77 K. In
the phosphorescence spectra, the vibronic sub-band with the
highest energy represented triplet energies (ET) of 14 were
observed; 2.71, 2.69, 2.66, and 2.65 eV for 1, 2, 3, and 4, respectively.
The triplet energies of 14 are higher than carbon-based compound, TPBi (ET 2.63 eV) [24], which indicates that silicon atom
effectively breaks the conjugation and attenuates the triplet wave
function. Furthermore, the triplet energy levels of compounds were
sufciently higher than that of Ir(ppy)3, a phosphorescent dopant
that emits green light. Therefore, we expect that these electrontransporting materials, 1e4, would effectively conne the triplet
excitons on the dopant and prevent the back energy transfer.
Absorption
129
Wavelength (nm)
Fig. 2. Steady-state absorption and emission spectra of compounds 1e4 in dichloromethane (DCM) solution.
24000
1
2
3
4
22000
20000
18000
16000
14000
12000
10000
8000
450
500
550
600
Wavelength(nm)
Fig. 3. Emission spectra of compounds 1, 2, 3, and 4 in 2-methyl-tetrahydrofuran (2MeTHF) solution at 77 K.
Table 1
Photophysical and electrochemical properties of 14.
1
2
3
4
a
b
c
d
e
Ered (V)c
HOMO (eV)d
LUMO (eV)e
Eg (eV)
301
302
307
306
358
359
361
363
457,
461,
466,
468,
1.85
1.84
1.88
1.88
6.56
6.57
6.50
6.49
2.89
2.90
2.86
2.86
3.67
3.67
3.64
3.63
(105.4)
(149.8)
(235.6)
(260.8)
490,
493,
495,
501,
523
528
523
531
Measured in DCM.
Measured in 2-MeTHF.
Measured in THF.
The HOMO levels were determined using the following equation: EHOMO(eV) ELUMOEg.
The LUMO levels were determined using the following equation: ELUMO(eV) e(Ered(V vs Fc/Fc) 4.74 V).
(a)
2
120
Electron-only devices
EOD with TPBi
EOD with 2
EOD with 3
100
80
60
40
20
0
10 11 12
Voltage (V)
(b)
1E-11
TPBi
2
3
1E-12
2
1E-13
J/E (A/V )
130
1E-14
1E-15
1E-16
500
600
700
800
1/2
900
1/2
1/2
E (V /cm )
Fig. 5. (a) JeV characteristics of electron-only devices (EODs) for TPBi, compounds 2
and 3. Devices were fabricated with the following structures: ITO (150 nm)/Al (50 nm)/
2 or 3 (50 nm)/Liq (1 nm)/Al (100 nm). (b) The JeV characteristics for TPBi, compounds
2
and
3
were
tted pto
SCLC
with
eld
dependent
mobility.
J 9=80 r E2 =Lm0 exp0:89b E, where J is the current density; 0r is the dielectric constant; E is the electric eld; L is the lm thickness; m0 is the zero-eld carrier
mobility; and b is the Poole Frenkel factor. The values of m0 and b were calculated by
assuming r is equal to 3. The eld
p dependent mobility was calculated using Poole
Frenkel equation: m m0 expb E.
131
Fig. 6. Energy level diagram and chemical structures of the used materials. Device structure: ITO (150 nm)/HATCN (10 nm)/TAPC (90 nm)/CBP:Ir(ppy)3 8% (20 nm)/2 or 3 (60 nm)/
Liq (1 nm)/Al (150 nm).
Fig. 7. (a) JeVeL characteristics, (b) current efciencyecurrent density curves, (c) power efciencyecurrent density curves, and (d) EQE-current density curves of devices I and II.
132
Table 2
EL performances of the devices with 2 and 3 as ETMs.
Device
Device I
Device II
Turn on (V)
3.0
3.6
EQE (%)
Max
1000 nits
Max
1000 nits
Max
1000 nits
CIE
61.8
57.7
28.0
19.0
62.8
63.7
58.0
52.5
18.0
18.1
16.6
14.9
(0.30,0.62)
(0.29,0.63)
Device congurations: Device I: ITO (150 nm)/HATCN (10 nm)/TAPC (90 nm)/CBP:Ir(ppy)3 8% (20 nm)/3 (60 nm)/Liq (1 nm)/Al (150 nm), device II: ITO (150 nm)/HATCN
(10 nm)/TAPC (90 nm)/CBP:Ir(ppy)3 8% (20 nm)/2 (60 nm)/Liq (1 nm)/Al (150 nm).
Conict of interest
The authors declare that they have no competing nancial
interest.
References
[1] C.W. Tang, S.A. VanSlyke, C.H. Chen, J. Appl. Phys. 65 (1989) 3610.
[2] M.A. Baldo, D.F. O'Brien, Y. You, A. Shoustikov, S. Sibley, M.E. Thompson,
S.R. Forrest, Nature 395 (1998) 151.
[3] S.J. Su, T. Chiba, T. Takeda, J. Kido, Adv. Mater. 20 (2008) 2125.
[4] F. So, J. Kido, P. Burrows, MRS Bull. 33 (2008) 663.
[5] T.D. Anthopoulos, P.J. Jonathan Markham, E.B. Namdas, Ifor D.W. Samuel, Appl.
Phys. Lett. 82 (2003) 4824.
[6] S.W. Culligan, A.C.-A. Chen, J.U. Wallace, K.P. Klubek, C.W. Tang, S.H. Chen,
Adv. Funct. Mater. 16 (2006) 1481.
[7] G.G. Malliaras, J.C. Scott, J. Appl. Phys. 83 (1998) 5399.
[8] S. Naka, H. Okada, H. Onnagawa, Y. Yamaguchi, T. Tsutsui, Synth. Met.
111e112 (2000) 331.
[9] B. Krummachera, M.K. Mathai, V. Choongb, S.A. Choulis, F. So, A. Winnacker,
Org. Electron. 7 (2006) 313.
[10] C. Adachi, T. Tsutsui, S. Saito, Appl. Phys. Lett. 56 (1990) 799.
[11] H. Tang, F. Li, J. Shinar, Appl. Phys. Lett. 71 (1997) 2560.
[12] M. Thelakkat, H.W. Schmidt, Polym. Adv. Technol. 9 (1998) 429.
[13] M.Y. Lai, C.H. Chen, W.S. Huang, J.T. Lin, T.H. Ke, L.Y. Chen, M.H. Tsai, C.C. Wu,
Angew. Chem. Int. Ed. 47 (2008) 581.
[14] Y. Li, M.K. Fung, Z. Xie, S.T. Lee, L.S. Hung, J. Shi, Adv. Mater. 14 (2002) 1317.
[15] C.H. Chen, W.S. Huang, M.Y. Lai, W.C. Tsao, J.T. Lin, Y.H. Wu, T.H. Ke, L.Y. Chen,
C.C. Wu, Adv. Funct. Mater. 19 (2009) 2661.
[16] W.S. Han, H.J. Son, K.R. Wee, K.T. Min, S. Kwon, I.H. Suh, S.H. Choi, D.H. Jung,
S.O. Kang, J. Phys. Chem. C 113 (2009) 19686.
[17] M. Debeaux, M.W. Thesen, D. Schneidenbach, H. Hopf, S. Janietz, H. Krger,
A. Wedel, W. Kowalsky, H.H. Johannes, Adv. Funct. Mater. 20 (2010) 399.
[18] SMART and SAINT, Bruker Analytical X-Ray Division, Madison, WI, 2002.
[19] G.M. Sheldrick, SHELXTL-PLUS Software Package, Bruker Analytical X-Ray
Division, Madison, WI, 2002.
[20] M.J. Frisch, et al., Gaussian 09, Revision D.01, Gaussian Inc., Wallingford, CT,
2013.
[21] Cambridge Soft Corporation, Cambridge, MA, USA, http://www.cambridgesoft.
com/.
[22] K. Lonsdale, International Tables for X-ray Crystallography vol. III, D. Reidel
Publishing Company, 1983, p. 275.
[23] http://www.chem.gla.ac.uk/~louis/software/ortep3/download.html.
[24] F. Wang, J. Hu, X. Cao, T. Yang, Y. Tao, L. Mei, X. Zhang, W. Huang, J. Mater.
Chem. C 3 (2015) 5533.
[25] W. Brtting, S. Berleb, A.G. Mckl, Org. Electron. 2 (2001) 1.
[26] P.N. Murgatroyd, J. Phys. D. Appl. Phys. 3 (1970) 151.
[27] T.Y. Asuda, Y. Yamaguchi, D.C. Zou, T. Tsutsui, Jpn. J. Appl. Phys. 41 (2002)
5626.