Subject - Engineering Metrology And Measurement Systems (MECH 6491)
Instructor Name - Narayanswamy R Sivakumar Texture Process Monitoring In Solar Cell Manufacturing Using Optical Metrology The journal gives the description about a new optical metrology technique which is invented to analysis the textured silicon wafers used to made solar cells. A non alcoholic chemical etching formulation along with single step texturization process was governed to these wafers and the results were correlated with SEM imaging. The Crystalline Silicon based solar cells have the specific property to lessen the reflection losses through many internal reflections occurred on their textured surface. The specific dimension of pyramid is 3-8 micrometer for ongoing production lines. The various problems to measure the surface topography with contact based profiler is due its ruff nature and for non-contact based profiler technique is due its tremendously spongy nature. The texture process and wafer thickness are the significant factors to develop because the cost of silicon cell is approximate half of the solar cell production process. To raise the signal from surfaces having reflectivity well below 1%, an optical design was progressed which allowed the examination of Si3N4 laminated and uncovered wafers of various sizes of pyramids. The data of pyramid heights conferred in this experiment was achieved the Zeta-20 3D imaging and metrology microscope which develop 3D pictures of surfaces. A novel optical design is used by Zeta microscope which makes the height settlement which is lesser than the depth of focus. For calculating surface roughness, pyramid base dimension and pyramid heights automatically a software indentifying pyramids on silicon and nitrite coated and bare wafers was introduced. Perkin Elmer Spectrometry was used for reflectivity measurements. The relationship between pyramid height and size measurements was made by measuring surface reflectivity and minority carriers lifetime for particular wafers group a chosen group of wafers was terminated through process having different situation after that some wafers were remain untouched and other were laminated with silicon nitrate. The pyramid size is enlarged with exposure time when wafers were pass through changing eth bath life, etching time an additives. The size of pyramids is advantageous at 20 minutes exposure time due to minimal reflectivity on surface. The solar cell gives its best performance when surface ratio is ideal in 15-20 minutes etching time. To end up, the optical metrology inspection method is discovered to monitor pyramid dimensions and there is first increment in the pyramid height and then decline as the wafer is etched and over etching reduce the surface area ration parameter. The optical micrometer did not describe about the effect of the coating of the silicon nitride on the wafer. REFERENCES
1. K. Wijekoon et al.,Production Ready Novel Texture Etching Process for Fabrication of
Single Crystalline Silicon Solar Cells, 35th IEEE PVSC, 2010, pp 3635 -3641 2. P. Campbell, M. A. Green, J. Appl. Phys. 62, 243, 1987 3. B. L. Sopori, Sol. Cells, 25, 15, 1988 4. J. D. Hilton et al., Progress in Photovoltaic Research and Applications, 4, 435, 1996