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60 IEEE TRANSACTIONS ON ELECTRON DEVICES, VOL. 59, NO.

1, JANUARY 2012

Generalization of the Concept of Equivalent


Thickness and Capacitance to Multigate
MOSFETs Modeling
Nicolas Chevillon, Jean-Michel Sallese, Christophe Lallement, Member, IEEE, Fabien Prgaldiny,
Morgan Madec, Josef Sedlmeir, and Jasmin Aghassi

AbstractIn this letter, we propose to introduce the notion of which technology is quite challenging and not yet adopted by
equivalent capacitance and to generalize the so-called equivalent- the industry.
thickness concept to model arbitrary shapes of lightly doped Conversely, multigate MOSFETs such as FinFETs and -
nonplanar multigate MOSFETs, without the need to introduce
any unphysical parameter. These definitions, which merely map FETs [3] have proven their compatibility with standard CMOS
a multigate geometry into the symmetric double-gate (DG) MOS- technology and lithography techniques, leading to basic circuits
FET topology, have been validated by extensive comparison with [4]. Today, FinFETs are foreseen as next-generation devices for
3-D numerical simulations of quadruple-gate, triple-gate (TG), microprocessors [5]. But, modeling multigate architectures is
triangular gate, cylindrical gate-all-around, and DG Fin Field Ef- quite complex, the main reason being that the structure is 2-D,
fect Transistors (FinFETs). Based on this modeling approach, any
multigate architecture inherits of the fundamental relationships
and hence, no simple solution exists for the BoltzmannPoisson
that have been developed for planar DG MOSFETs, including equation. An empirical approach was proposed by Yu et al.
the normalization of all electrical quantities that considerably [6], who introduced some arbitrary smoothing functions and
simplifies its analysis. In addition, considering a constant mobility, fitting parameters in order to fit the charges and the current in
we find that the model can predict electrical characteristics of nonplanar multigate topologies. In their approach, the authors
FinFETs from 275 to 425 K, without the need for any additional
extended their cylindrical surrounding-gate (SG) MOSFETs
parameters. Finally, we were able to predict electrical measure-
ments of a TG MOSFET, making of this generic model an interest- model to quadruple-gate (QG) MOSFETs. They noted that,
ing candidate for a design-oriented compact model for arbitrary when volume inversion occurs, the subthreshold current is
multigate MOSFETs geometries. proportional to the area of the cross section of the silicon
Index TermsMOS devices, semiconductor device modeling, body. On the other hand, well above threshold, the current
semiconductor devices. becomes proportional to the perimeter of the cross section of
the silicon body. In their approach, the QG was modeled as
I. I NTRODUCTION an SG, but the transition between subthreshold and above-
threshold regimes requires an empirical function depending
A S FAR as compact modeling is concerned, the simplest
multigate MOSFET device to model is undoubtedly the
fully depleted symmetric double-gate (DG) MOSFET. Dif-
on the gate voltage. Hence, the authors proposed a model for
partially surrounding rectangular multiple-gate MOSFETs as
ferent approaches have been proposed. Yu et al. [1] initially a linear combination of a DG and a QG model. For instance,
developed an exact solution that is still difficult to use in the the triple-gate (TG) MOSFET was considered as an average of
context of compact modeling, where more simple relationships a DG and a QG having the same cross section and the same
are preferred. Next, a more compact formulation was proposed gate oxide thickness as for the TG. To model -FET or Pi-FET,
by Sallese et al. [2], where an approximate solution was sought other empirical functions are required, together with empirical
and led to a more compact but still accurate formulation. parameters extracted from Technology Computer Aided Design
However, these models concern the symmetric DG MOSFET, (TCAD) simulations that could not be predicted from simple
analysis.
Next, an interesting and complete analytical modeling of
Manuscript received July 28, 2011; revised September 9, 2011; accepted multiple-gate MOSFETs in subthreshold was proposed by
October 3, 2011. Date of publication October 27, 2011; date of current version
December 23, 2011. This work was supported by the European Compact Ritzenthaler et al. [7]. The potential in the volume of the
Modelling Network (COMON), Industry Academia Partnerships and Pathways channel was obtained by solving the 3-D Laplaces equation,
research project under Grant FP7-IAPP-218255. The review of this letter was where the electrostatic potential along the most leaky path
arranged by Editor S. Deleonibus.
N. Chevillon, C. Lallement, F. Prgaldiny, and M. Madec are with the Institut from source to drain was used to get an analytical subthreshold
dlectronique du Solide et des Systmes, Centre National de la Recherche current expression. As for [6], the draincurrent characteristics
Scientifique, Universit de Strasbourg, 67412 Illkirch, France. from weak to strong inversion were obtained by means of
J.-M. Sallese is with cole Polytechnique Fdrale de Lausanne, 1015
Lausanne, Switzerland (e-mail: jean-michel.sallese@epfl.ch). smoothing functions.
J. Sedlmeir and J. Aghassi are with Intel Mobile Communications GmbH, In addition to these approaches is the solution proposed
85579 Neubiberg, Germany. in [2] that consists in calculating the potential of the silicon
Color versions of one or more of the figures in this letter are available online
at http://ieeexplore.ieee.org. layer in weak inversion, without the need for any empiri-
Digital Object Identifier 10.1109/TED.2011.2171347 cal parameter. Recently, this approach has been extended to

0018-9383/$26.00 2011 IEEE


CHEVILLON et al.: EQUIVALENT THICKNESS AND CAPACITANCE TO MOSFETs MODELING 61

introduce some simplifications that are based on two simple as-


sumptions. Likewise for the DG MOSFET, in strong inversion
mobile charges will locate at the Si/SiO2 interfaces, the volume
of silicon having little impact on the global charge density. This
means that the device reverts to a quasi 1-D system, which
suggests that the solution obtained for the long-channel DG
MOSFET may still be accurate enough to estimate the charge
density in strong inversion for the rectangular FET.
Now, considering weak inversion (although subthreshold
would be more adopted when considering undoped devices, we
propose to still use weak inversion for simplicity), the right-
hand side term in (1) cancels, and we note that setting (x, y)
to constant value 0 is a viable solution. Therefore, the charge
density is uniform in the silicon, and the current only depends
on the area of the cross section of the body. The device is in
volume inversion.
To some extent, these arguments justify that the rectangular
multigate MOSFET can be planarized and considered as a
DG MOSFET having the same Si/SiO2 interface perimeter,
ensuring consistency with strong inversion, and also the same
volume of silicon to match subthreshold characteristics. In this
attempt, we simply ignore corner effects, which are known to
be negligible in a lightly doped channel [9].
Based on these considerations, we propose to show how the
QG MOSFET can be modeled as a simple DG MOSFET. In [2],
Fig. 1. Schematic of multigate MOSFET cross sections. (a) DG MOSFET.
(b) QG MOSFET. (c) TG MOSFET. (d) GAA MOSFET. (e) Triangular we have shown that, in a symmetric DG MOSFET, the charge
MOSFET. (f) DG FinFET. potential relationship is given by
 
QG QG 2
VG Vch = + UT ln C1
simulate doped symmetric DG MOSFETs by introducing the Cox 2 Si q UT ni
so-called equivalent-thickness concept [8]. Based on this work,  0 V 
ch
we propose to discuss how this concept can be extended to with C1 = e UT (2)
account for nonplanar geometries, ending with a generic com-
pact model with neither empirical relationships nor empirical where QG is the gate charge density, Cox is the gate oxide
parameters. capacitance, C1 is an integration constant that plays a role
mainly in weak inversion and which was approximated in [2],
and is the work function difference between the gate and
II. D EFINITION OF THE E QUIVALENT S ILICON T HICKNESS the silicon.
FOR THE R ECTANGULAR FET
Here is the point that is worth to be discussed: C1 is re-
In order to introduce the idea of the equivalent-silicon- lated to the potential at the center of the DG MOSFET, i.e.,
thickness concept of a DG MOSFET [see Fig. 1(a)] for SG 0 , and therefore, its value is closely linked to the mobile
geometries, we propose to illustrate such a definition on a charge density. In our QG MOSFET case, since the potential
rectangular FET (QG) as the one depicted in Fig. 1(b). is uniform across the silicon in weak inversion, the electron
concentration in the channel is ni e(0 Vch )/UT , involving a
quantity of charges in the cross section of the channel that
A. Derivation of the Mobile Charge Density is equal to q ni e(0 Vch )/UT (HSi WSi ). This leads to
Unlike planar DG MOSFETs, strictly speaking, the a gate charge density per unit surface for the QG that is
BoltzmannPoisson equation has to be solved in two dimen- given by
sions, leading to 0 Vch

 (x,y)V  q ni e UT
(H Si WSi ) .
d2 (x, y) d2 (x, y) q ni ch QG =
QG WI (3)
+ = e UT
(1) 2 (HSi + WSi )
dx2 dy 2 Si
where is the electrostatic potential, q is the elementary Then, for the QG MOSFET, a relationship exists between
electronic charge, ni is the silicon intrinsic concentration, Si the integration constant and the gate charge density evaluated
is the dielectric constant of the silicon, Vch is the quasi-Fermi in weak inversion, i.e.,
potential for electrons, and UT is the thermodynamic voltage.
  QG WI
QG
Unlike its 1-D counterpart, this nonlinear differential equation C1 QG WI
QG = HSi WSi
. (4)
has no exact analytical solution. At this point, it is interesting to q ni 2(HSi +WSi )
62 IEEE TRANSACTIONS ON ELECTRON DEVICES, VOL. 59, NO. 1, JANUARY 2012

From these arguments, the chargepotential relationship for


the QG MOSFET becomes
QG
VG Vch = + UT
Cox


QG 2 QG
ln + (5)
2 Si q UT ni T
q ni 2eq

with the definition of an equivalent thickness given by


HSi WSi
Teq = . (6)
HSi + WSi
Likewise in [8], we propose to introduce some normalization
that will be very useful for the model coherence and for circuit
design purposes. Therefore, voltages and charges are normal- Fig. 2. Drain current of a QG MOSFET with a square cross section as
ized as v = V /UT and q = Q/Qsp , where Qsp = 4 Cox UT , a function of gate voltage in linear and saturation regimes. (Symbols) 3-D
leading to a dimensionless fundamental relationship simulations. (Lines) Model.
 
cox
vg vto vch = 4 qg + ln(qg ) + ln 1 + qg .
CSi_eq
(7)
Here, vto is the normalized long-channel threshold voltage
defined as
 
8 Cox UT
vto = ln (8)
q ni Teq

and CSi_eq = Si /Teq is the equivalent silicon capacitance.

B. Normalized Current and Equivalent Width


Since relation (7) is formally the same as (10) in [2], we
can use the same current expression as in [2] and the same
convention for the equivalent DG width, which is here half of
the silicon perimeter, i.e., Weq = HSi + WSi . Fig. 3. Drain current of a QG MOSFET with a square cross section as a
function of drain voltage in linear and saturation regimes. (Symbols) 3-D
Therefore, these equivalent geometrical parameters simulations. (Lines) Model.
(Teq and Weq ) will now replace their DG counterparts in
the current normalization factor.
The specific current for the QG MOSFET is then defined as 1000 cm2 /V s was used. Physical and equivalent parameters
were obtained from the same set of geometrical and technolog-
IS = 4 Cox UT 2 (Weq /L) (9)
ical parameters.
where L is the channel length; and the corresponding normal- Simulations have been carried out in a QG MOSFET having
ized current becomes a square cross section of 40 nm 40 nm. The channel length
  was set to 1 m. In this case, the equivalent silicon thickness
CSi_eq Cox and channel width are 20 and 80 nm, respectively. Figs. 2
i = qm + 2 qm + 2
2
ln 1 qm
Cox 2 CSi_eq and 3 show the current versus the gate voltage at low and
Si high drain voltages, as well as the current versus the drain
with CSi_eq = (10) voltage for different gate voltages. For both characteristics, a
Teq
comparison of the model [see relations (9) and (10)] with 3-
where the physical silicon capacitance is replaced by its equiv- D simulations confirms the validity of the modeling approach
alent value CSi_eq (note that qm = 2 qg ). presented so far. With regard to the drain current dependence
on the gate voltage (see Fig. 2), the accuracy is pretty good,
both in linear and log scales, and without the need to introduce
C. Comparison With 3-D Numerical Simulations
any empirical parameter. Similarly, the matching is very good
In this section, we propose to assess the analytical model for the output characteristics, as shown in Fig. 3. Therefore, the
for QG MOSFETs based upon the equivalent thickness and transformation of the QG MOSFET into a DG MOSFET based
width versus full 3-D numerical simulations [10]. In order to on the equivalent geometrical parameter definitions seems to be
minimize the number of parameters, a constant mobility of totally justified.
CHEVILLON et al.: EQUIVALENT THICKNESS AND CAPACITANCE TO MOSFETs MODELING 63

III. G ENERALIZATION OF THE E QUIVALENT T HICKNESS


TO A RBITRARY SG G EOMETRIES

So far, we have been able to simulate charges and current


in square-shaped MOSFETs relying on a generic relationship
while defining an equivalent silicon thickness. Assuming a
constant oxide capacitance along the silicon channel perimeter,
we can go one step further and propose a generalization of this
approach to arbitrary SG geometries (not only square).
Starting from a device having a silicon channel with section
S and perimeter P , when the potential is uniform inside the de-
vice (i.e., weak inversion), (x, y) = 0 . Therefore, following
the same approach as in Section II, we get a generic relationship
between charges and potentials that is simply (6) including the
equivalent thickness defined as
2S Fig. 4. Drain current of a triangular gate MOSFET as a function of gate
Teq = . (11) voltage in linear and saturation regimes. (Symbols) 3-D simulations. (Lines)
p Model.

With regard to the current, we can still define a normalized


current as solution for the charge and current versus potential relation-
  ships has been proposed in [12].
CSi_eq Cox The BoltzmannPoisson differential equation is now ex-
i = qm 2 + 2 qm + 2 ln 1 qm
Cox 2 CSi_eq pressed in cylindrical coordinates, i.e.,
(12)
with CSi_eq = Si /Teq and Weq = P/2, and the specific cur- d2 (r) 1 d(r) q ni (r)V ch
+ = e UT (13)
rent is still given by Isp = 4 Cox UT 2 (Weq /L). dr 2 r dr Si
Note that, when the curvature radius of the silicon channel
becomes comparable to the oxide thickness, it is mandatory to where r is the radius. Contrary to the planar DG MOSFET, this
rely on a more accurate expression for the gate oxide capaci- equation has an exact solution [13] given by
tance as this is no longer obtained by considering the shortest  
distance between the gate and the silicon. This was illustrated 8 B UT Si
(r) = Vch + UT ln . (14)
in the case of the gate-all-around (GAA) MOSFET. Such a (1 + B r )
2 2 q ni
gate capacitance should be carefully evaluated, particularly in
strong inversion, where this parameter has a strong impact on Here, the term B is related to the surface potential condition.
the charge versus potential dependence (although it also affects By considering the charge expression of the gate oxide capac-
weak inversion through the threshold voltage). itance, i.e., QG = Cox (VG (RSi )), and applying
Ultimately, we propose to verify the validity of the equivalent the Gauss theorem at the Si/SiO2 interface, i.e., QG = Si
thickness for a triangular cross section SG MOSFET [see (d(r)/dr)|r=RSi , we can show that we obtain an implicit
Fig. 1(e)], as studied in [11]. The choice for this geometry is relationship between the potentials and the gate charge density
motivated by the fact that it combines both 2-D geometry and given by
sharp corners, which could complicate its modeling.    
The device of interest consists in an equilateral triangu- VG Vch 8 QG QG
ln = + ln
lar silicon MOSFET, with all sides WSi equal to 10 nm. UT RSi
2 Cox UT Q0
 
From relation (11), the equivalent thickness is then Teq = QG 4 Si UT
1/3 WSi 2 (WSi /2)2 , and the equivalent width for the spe- + ln 1 + with Q0 = (15)
Q0 RSi
cific current is Weq = 3/2(WSi ).
Fig. 4 shows 3-D simulations of the drain current versus the where RSi is the radius of the nanowire silicon, = (q
gate voltage for this triangular MOSFET. We still observe a ni )/(Si UT ) is a parameter depending on the semiconductor
very good agreement with the DG model using the equivalent- properties, and Cox is the gate oxide capacitance per unit
thickness concept, supporting that this approach is robust even surface for the GAA, which is given by
if angles between the gates become acute.
ox
Cox =  (16)
IV. C ASE S TUDY: T HE GAA FET RSi ln 1 + Tox
RSi

A. Approximate DG Solution as an Exact Solution for GAA


Tox being the oxide thickness.
The ultimate nonplanar multigate architecture is undoubtedly Equation (15) has strong similarities with the generic relation
the GAA MOSFET [see Fig. 1(d)]. Interestingly, an analytical (2) that we have used so far to model DG MOSFETs. Indeed,
64 IEEE TRANSACTIONS ON ELECTRON DEVICES, VOL. 59, NO. 1, JANUARY 2012

the normalized chargepotential relationship for a symmetric


DG MOSFET is
q   
int Cox
vg v + ln = 4 qg + ln(qg )+ln 1+qg
2 CSi
(17)
where qg is the gate charge density normalized to specific
charge Qsp .
Now, using the same charge normalization factor as for the
DG MOSFET, the normalized GAA chargepotential relation-
ship takes the form
 
Cox
vg v vto = 4 qg + ln(qg ) + ln 1 + qg
CSi
(18)
Fig. 5. Drain current of a GAA MOSFET as a function of gate voltage
where the normalized gate charge density is qg = Qg /Qsp , the in linear and saturation regimes for different silicon radius. (Symbols) 3-D
simulations. (Lines) Model.
normalized threshold voltage is vto = ln((8 Cox UT )/(q
ni RSi )), and the silicon capacitance is defined as CSi =
Si /RSi .
From (18), we get a normalized chargepotential relationship
that is strictly identical to the planar DG approximate solution
[see (17)]. Given that (18) is an exact solution, we can wonder
if the equivalent silicon thickness still applies.
According to the definition, such an equivalent thickness
would be given by the surface divided by half of the wire
perimeter. Then, the equivalent thickness would be Teq =
( RSi 2 )/((2 RSi )/2) = RSi , which is indeed what was
obtained in (18).
Therefore, the definition of the equivalent thickness is fully
consistent with the exact solution of the PoissonBoltzmann
equation for the GAA. This is a remarkable property that was
somehow unexpected.
Next, we can adopt the same procedure as for the DG Fig. 6. Drain current of a GAA MOSFET as function of drain voltage in linear
and saturation regimes for different silicon radius. (Symbols) 3-D simulations.
MOSFET and calculate the current versus applied potentials (Lines) Model.
directly from relation (12). In this case, the equivalent width
will be half the silicon wire perimeter, i.e., Weq = RSi , B. Comparison With 3-D TCAD Simulations
implying that the normalizing factor for the current becomes As for the QG MOSFET, we ran TCAD simulations for the
RSi current versus gate and drain voltages. Since the solution used
ISP = 4 Cox UT 2 . (19) in (20) is now exact, we expect to have very good predictions of
L
the model. This is indeed the case for the wire radius of 10, 20,
Moreover, the normalized current is still given by and 30 nm, where the model is very accurate (see Figs. 5 and 6).
  A slight underestimation of the current at relatively high VDS
ID CSi Cox is reported.
i= = qm + 2 qm + 2
2
ln 1 qm
ISP Cox 2 CSi In conclusion, as far as the gate oxide thickness is uniform,
(20) the equivalent thickness has proven to be able to simulate
nonplanar multigate geometries with great accuracy. The case
and still, qm = 2 qg .
of nonconstant oxide capacitance is however important and
These strong similarities between DG and GAA MOS-
merit some attention. We propose to address this nonideal case
FETs lead to a unique formalism for both chargevoltage and
in the next section
currentvoltage relationships. Then, considering the correct
definition of the gate oxide capacitance, it comes out that the
V. L IMITS OF THE E QUIVALENT-T HICKNESS C ONCEPT
electrical characteristics of a GAA with radius RSi can be
AND N EED FOR AN E QUIVALENT C APACITANCE : T HE
predicted from a planar DG model using equivalent geometrical
C ASE OF PARTIALLY SG FETS
parameters Teq = RSi and Weq = RSi .
It is worth noticing that this apparently worst case in terms A. Nonuniform Gate Oxide Thickness
of departure to an ideal 1-D system can be exactly solved by
When the gate is not uniform all around the channel, as for
adopting the generic formalism when relying on the equivalent
DG FinFETs [see Fig. 1(f)] or TG MOSFETs [see Fig. 1(c)],
thickness definition.
CHEVILLON et al.: EQUIVALENT THICKNESS AND CAPACITANCE TO MOSFETs MODELING 65

assumption means that the strong inversion current at each


interface will appear for the same gate voltage.
Besides, in strong inversion, since qm is assumed not to
depend on the gate oxide thickness, so will be the normal-
ized current iSI ,which, in strong inversion, is approximated
by qm 2 + 2 qm . This means that the total current in strong
inversion ID SI for the DG FinFET can be expressed via the sum
of specific current ISP for each channel, i.e.,

ID SI = iSI (2 ISPLateral + ISPTop + ISPBottom ). (21a)

Fig. 7. Equivalent oxide capacitance network of the DG FinFET. Since the specific current for a given interface is ISP = 4
Coxinterface UT 2 (Winterface /L), from relation (21a), we
care must be taken since the gate capacitance is no longer obtain
constant. In the weak inversion regime, if we assume that 
4 UT 2 HSi
flatband happens in the whole volume of the silicon (we will ID SI = iSI 2 Cox + Cox_top_eq
see to what extent this is justified), this topology is expected to L 2

give the same current as for the QG since it only depends upon WSi WSi
the cross-section area of the silicon channel. + Cox_bottom . (21b)
2 2
However, in strong inversion, the smaller gate perimeter
around the channel implies that the ON-state current will be Or equivalently
decreased in regard to the QG. If we assume that the nongated
Weq
Si/SiO2 interfaces will not experience inversion, the equivalent ID SI = iSI 4 Cox_eq UT 2 (22)
L
thickness and the equivalent width can be defined by taking the
silicon perimeter covered by the thin gate oxide layer instead of where Weq = HSi + WSi , and Cox_eq is an equivalent gate
using the entire perimeter in (3). oxide capacitance given by
TG MOSFET: Therefore, a TG model can be derived from
the generic SG model introduced in Section III, by considering Cox HSi +Cox_top_eq WSi /2+Cox_bottom WSi /2
Cox_eq = .
that geometrical parameter P is the perimeter of the silicon HSi + WSi
(23)
covered by the thin gate. From their definitions, the equiv-
alent width and equivalent thickness are Weq = HSi + WSi /2 Now, let us define Cox_bottom and Cox_top_eq as the equivalent
and Teq = (2 HSi WSi )/(2 HSi + WSi ), respectively. oxide capacitance values per unit surface for the bottom and
DG FinFET: Contrary to the TG MOSFET, the DG FinFET top interfaces and Cox (= ox /Tox ) as the oxide capacitance for
has a thicker top oxide thickness called Tox_top . When this the lateral interfaces.
thickness is large enough, we can consider this device as a Therefore, adopting these new definitions, we can consider
planar DG MOSFET and model it as such. the DG FinFET as a QG with a specific current given by ISP =
However, even for an oxide layer thicker than its nominal 4 Cox_eq UT 2 ((HSi + WSi )/L).
value, the related interface could still be a conducting channel The equivalent gate oxide capacitance has been derived
when the gate bias exceeds some threshold voltage. This is under the strong inversion condition, but since the subthreshold
indeed supported by 3-D simulations. Therefore, additional charge density is almost independent of the capacitance, we can
currents located at thick oxide interfaces should also be taken still adopt the equivalent capacitance regardless of the mode of
into account when accurate modeling of non-SG architectures operation.
is carried out. The normalized current is still given by
 
CSi_eq Cox_eq
i = qm 2 + 2 qm + 2 ln 1 qm
B. Definition of the Equivalent Oxide Capacitance Cox_eq 2 CSi_eq
(24)
Case of the DG FinFET: Basically, if we consider that, in
strong inversion, each channel is independent, meaning that with equivalent thickness Teq = (HSi WSi )/(HSi + WSi ) and
the normal electric field at the Si/SiO2 interfaces dominates, the equivalent silicon capacitance CSi_eq = Si /Teq .
total current of the DG FinFET (see Fig. 7) can be considered Finally, the problem reverts to finding an analytical expres-
as the sum of all Si/SiO2 channel currents. sion for the individual capacitance values that come into play.
In addition, if the oxide thickness is different at each inter- Generalization: The aforementioned result can be general-
face, it will affect both the related threshold voltage and the ized to any type of FET device having a common gate with n
normalized current [see (12)]. body/oxide interfaces of length Li and capacitance Ci .
At this point, it is interesting to introduce a basic assumption In that case, if we assume that the device can be planarized so
that consists in considering that the threshold voltages for thin as to revert to a DG MOSFET, each side length will represent
and thick gate oxide interfaces will be almost the same. The half of its counterpart in DG topology (since the width of a
validity of this approximation will be discussed later. This DG is expected to be twice its geometrical size), and if we still
66 IEEE TRANSACTIONS ON ELECTRON DEVICES, VOL. 59, NO. 1, JANUARY 2012

TABLE I Concerning the bottom oxide capacitance (with no gate elec-


C ORRESPONDENCE B ETWEEN THE G ATE S IDEWALL AND T OP OXIDE
G EOMETRIES trode) related to the buried oxide (BOX) (see Fig. 7), an expres-
sion for the position-dependent fringing capacitance between
the body and the gate, at the body/BOX interface, was proposed
by Ernst et al. [15], i.e.,
ox 1
CBG (x) =  WSi  . (29)
TBOX exp
TBOX x 2 1

The total capacitance is then obtained by integrating (30)


assume a common threshold voltage, then the corresponding
from 0 to WSi /2, leading to a bottom oxide capacitance per
specific current will be the sum of all specific currents ISP_i ,
unit area given by
i.e.,
WSi

n 
n
Li /2 Cox_bottom = ox
ISP = ISP_i = 4 UT 2
Ci 2
L  
i=1 i=1 (WSi +2Tox )
WSi 1 exp 2tBOX 1
= 4 UT 2 Cox_eq Weq /L (25) + ln  . (30)
2 TBOX exp Tox
1
 TBOX
where the equivalent thickness is given by Weq = ni=1 Li /2,
i.e., consistent with the definition introduced before, and the Having defined all these terms, the total equivalent gate oxide
equivalent gate oxide capacitance per unit surface (in a DG capacitance for the DG FinFET Cox_eqDG_FinFET can be calcu-
sense) is defined as lated according to (23).
n n In the special case of a TG MOSFET, since the top gate has
Ci Li /2 i=1 Ci Li
Cox_eq = n i=1
=  n . the same oxide thickness than the lateral gates, from (26) the
L
i=1 i /2 i=1 Li equivalent oxide capacitance becomes
Note that from (26), the equivalent oxide capacitance reverts to (HSi + WSi /2) Cox + (WSi /2) Cox_bottom
the mean value of the capacitance per unit surface in the context Cox_eqTG = .
HSi + WSi
of a DG formalism. (31)
Accurate Evaluation of Top and Bottom Capacitance Values
Here, it is worth noticing that, when the top and the bottom
in DG FinFETs: Whereas thin gate oxide capacitance values
capacitance are negligible, the equivalent capacitance reverts to
are well depicted by the semi-infinite capacitor model, this
oxide capacitance Cox of a planar DG MOSFET, thus proving
ideal view breaks down when the capacitor thickness becomes
the consistency of equivalent capacitance definition.
comparable to its length. This is what happens when modeling
the top gate capacitance in a DG FinFET-like device. In that
case, some special treatment is needed. For this purpose, we C. Three-Dimensional TCAD Simulations of a DG FinFET
attempted to evaluate this capacitance following the work of
Roy et al. [14] who modeled gate sidewall capacitance, given Fig. 8 shows the current of a DG FinFET versus the gate
that the actual configuration of the sidewall oxide capacitance voltage, at low (0.1 V) and high (1 V) drain voltages, for
is almost the same. The correspondences with [14] are listed in channel length L = 1 m, silicon height HSi of 60 nm, silicon
Table I. width WSi of 20 nm, top oxide thickness Tox_top of 50 nm,
Following [14], the scaling factor becomes lateral oxide thicknesses Tox of 1.5 nm, and BOX thickness
 TBOX of 30 nm.
2
Tox_top 2 W4SI + Tox WSI For this structure, we find the following equivalent quantities:
=  . (26)
2
Tox 2 Tox_top 2 + Tox 2 + W4SI + Tox WSI Teq = 15 nm, Weq = 80 nm, Tox_eq = 1.88 nm, and
ISP = 4 ox /Tox_eq UT 2 Weq /L.
Moreover, the approximated sidewall oxide capacitance per unit
area, which takes into account only the normal electric field, is Two different models are compared with the 3-D simulations
given by of the current. If we consider the DG FinFET as a purely
  DG MOSFET, i.e., we ignore the thick oxide interfaces, we
1 1 2
Cox_top_lateral = ox ln (27) observed that the current density is slightly underestimated
k WSI by the model in strong inversion. This mismatch comes from
the current originating from the top and bottom interfaces that
with k = 1 + 2 ( 2 + ). should indeed be taken into account.
Based on this analysis, the equivalent gate oxide capacitance On the other hand, the model including an equivalent oxide
for the top interface can be calculated as capacitance in a QG topology (which is closer to that of the
WSi Cox_top + WSi Cox_top_lateral FinFET) does not show this deviation and is found to be
Cox_top_eq = . (28) in very good agreement with 3-D TCAD simulations. This
WSi
CHEVILLON et al.: EQUIVALENT THICKNESS AND CAPACITANCE TO MOSFETs MODELING 67

Fig. 8. Drain current of a DG FinFET as a function of gate voltage in Fig. 10. Drain current of a TG MOSFET as a function of gate voltage in linear
linear and saturation regimes with a 50-nm top oxide thickness. (Symbols) and saturation regimes. (Symbols) 3-D simulations. (Dashed lines) TG model.
3-D simulations. (Dashed lines) DG model. (Solid lines) QG model with the (Solid lines) QG model with the equivalent oxide capacitance.
equivalent oxide capacitance.

Fig. 11. Drain current of a TG MOSFET as a function of drain voltage in


Fig. 9. Drain current of a DG FinFET as a function of gate voltage in linear linear and saturation regimes. (Symbols) 3-D simulations. (Lines) Model.
and saturation regimes for different silicon width WSi with a 50-nm top oxide
thickness. (Symbols) 3-D simulations. (Lines) QG model with the equivalent to predict the electrical behavior of a long-channel bulk FinFET
oxide capacitance. without the need for any additional parameters.

confirms that the additional currents attributed to the thick oxide


VI. VALIDITY OF THE M ODEL FOR
interfaces, which are taken into account without introducing
H IGH -T EMPERATURE O PERATION
any empirical parameter or smoothing function, must be part of
the model. At this point, it is worth noticing that the equivalent In this section, we propose an extension to the temperature
oxide thickness is involved in all operating regime of the device dependence for the multigate model. To the initial DG model
but does not affect the weak inversion operation in regard to the [2], we add a mobility model depending on the transverse
DG model, which is indeed what we would expect. electric field and on the temperature. We present a validation
Fig. 9 shows the results obtained with the DG FinFET model of the model with 3-D TCAD simulations of DG FinFET,
for whether a thin silicon body or a large one, i.e., having a TG, and GAA MOSFETs, for temperatures varying from 275
value close to the silicon height. For the TG MOSFET, the to 425 K. Finally, the model will be assessed with electrical
current that arises from the thick oxide thickness interfaces measurements of a TG MOSFET for temperatures between
is well accounted by the fringing gate capacitance proposed 273.15 and 373.15 K.
so far (see Figs. 10 and 11). For both DG FinFETs and TG
MOSFETs, combining the planar and the fringe capacitance is
A. Modeling
thus fully justified and validates the concept of an equivalent
oxide capacitance for multigate MOSFETs compact modeling According to the long-channel DG model defined in [2],
with arbitrary geometries. Finally, without entering into the de- if we assume a constant mobility (and independent of the
tails, the model was also able to correctly predict bulk FinFET temperature), the effect of the temperature should already be
characteristics, i.e., DG FinFET without bottom oxide. Indeed, part of the model through intrinsic concentration ni and thermo-
we found that the TG model (presented in Section V-A) is able dynamic voltage UT , which are included in the normalization
68 IEEE TRANSACTIONS ON ELECTRON DEVICES, VOL. 59, NO. 1, JANUARY 2012

TABLE II
D ESCRIPTION OF THE M ODEL PARAMETERS

factors and, to a lesser extent, in the normalized threshold


voltage. On the other hand, also the energy gap of the silicon
(used to calculate the intrinsic carrier concentration) and the
dielectric constants depend on the temperature. However, these
contributions can be considered as second-order effects, and
therefore, these will be set to their values at 300 K.
The mobility model that we propose is adapted from the
model of Jeon and Burk [16]. This model is based on the recip-
rocal sum (Matthiessen rule) of three scattering mechanisms,
i.e., the phonon, Coulomb, and surface roughness scattering.
It explicitly depends on temperature T through the phonon
and Coulomb scattering and on transverse electric field Ee
through the phonon and surface roughness scattering. Since
at high temperature Coulomb scattering is negligible [16], we
keep only the phonon and roughness scattering terms, leading
Fig. 12. Drain current of a GAA MOSFET as a function of gate voltage
to [16] in linear and saturation regimes for different temperatures. (Crosses) 3-D
simulations. (Lines) Model.
1
= . (32)
a2 Tn Ee 1/
+ a3 Ee 2 phonon scattering coefficients are n = 1.3 and = 2, and the
low-field mobility extracted at 300 K is 0 = 1350 cm2 /V s.
Furthermore, in weak inversion, the electric field tends to
Fig. 12 compares 3-D TCAD simulations with the model for
zero and mobility would diverge, whereas we expect it to reach
the drain current versus the gate voltage in a 20-nm silicon
an asymptotic low field value. To remove this inconsistency, a
radius GAA MOSFET (both for VD = 0.1 and 1 V). The degra-
new parameter, i.e., a0 , was introduced. After transformation,
dation of the subthreshold slope, threshold voltage, and low-
we get
field mobility when the temperature is increased are accurately
a0 1 T n predicted. In strong inversion, the mobility degradation with
= (33) temperature is well taken into account both for high and low
1 + E0 Ee 1/ + E1 Ee 2 T n
drain voltages. Fig. 13 confirms that the model is still in good
where Ee is the transverse electric field calculated as in [17], agreement with full 3-D simulations at 400 K.
E0 and E1 are empirical parameters, and the low-field mobility The model accuracy for different geometries, i.e., DG Fin-
is 0 = a0 1 T n , with = 3 6 and n = 1 1.5 according FET, TG, and GAA MOSFETs, is summarized in Table III. In
to [16] (note that these are not intrinsic model parameters). addition, it is worth mentioning that Io (= ID (VGS = 0 V))
Concerning saturation effect, we adopt the model we intro- and Ion (= ID (VGS = 1 V)) are well estimated by the model.
duced in [17], which depends on the channel charge density,
mobility, and saturation velocity. In order to have a complete
temperature-dependent model, we followed the approach of
C. Model Validation With Measurements
Quay et al. [18], which also gives temperature dependence for
the saturation velocity. Table II shows all the parameters that Measurements were done in framework of the COMON
need to be extracted for long-channel devices. project on TG MOSFETs having gate lengths ranging from
70 nm to 1 m, Fin width WSi of 30 nm, and Fin height HSi
of 60 nm. The devices were processed with a SiON gate stack
B. Validation by 3-D TCAD Simulations
and TiN midgap gate electrode [14]. The oxide thickness was
We have studied the behavior of multigate devices for tem- approximately 1.9 nm. The results shown in this letter are for a
peratures ranging from 275 to 425 K. In the mobility model, the 1-m device length. Following the method developed in [19],
CHEVILLON et al.: EQUIVALENT THICKNESS AND CAPACITANCE TO MOSFETs MODELING 69

Fig. 13. Drain current of a GAA MOSFET as a function of drain voltage in Fig. 14. Drain current of a TG MOSFET as a function of gate voltage in linear
linear and saturation regimes. (Circles) 3-D simulations. (Lines) Model. and saturation regimes. (Crosses) Measurements. (Lines) Model.

TABLE III
M EAN VALUE FOR THE R ELATIVE E RROR IN P ERCENT B ETWEEN 3-D
TCAD S IMULATIONS AND THE M ODEL OF Ion AND Io C URRENTS ON A
275- TO -425-K T EMPERATURE R ANGE . T HESE R ESULTS A RE G IVEN FOR
D IFFERENT G EOMETRY OF DG F IN FET, TG, AND GAA MOSFET S

we have extracted effective channel length Le = 0.9 m Fig. 15. Drain current of a TG MOSFET as a function of drain voltage in lin-
and series resistance RSD298.15 K = 1300 at room temper- ear and saturation regimes for different temperatures. (Circles) Measurements.
ature. By extracting the series resistance for different tem- (Lines) Model.
peratures, we obtained a linear variation given by RSD (T ) =
RSD298.15 K [1 + aT (T 298.15)] with aT = 0.0108. age mechanisms exist such as the gate induced drain leakage
Comparisons Between Model and Measurements: Since the (GIDL) [20], the gate leakage, and the trap-assisted tunneling
model presented so far focuses on the intrinsic device prop- process [21]. In strong inversion, the good predictions of the
erties, additional extrinsic parameters related to the mobility model for low and high drain voltages justify the temperature-
dependence and access resistances should be taken into account dependent mobility relationship adopted here.
to simulate a real device. Without entering into the details, Fig. 15 shows the drain current versus the drain voltage
we give hereafter the main values that were obtained. For for Vg = 1 V at different temperatures. The saturation regime
the mobility coefficients and low-field mobility 0 at room is well modeled, as is the current in the linear region, also
temperature, we found n = 1.3, = 2, and 1350 cm2 /V s. meaning that the series resistance variation with temperature
Fig. 14 compares the measurements and the multigate model seems reasonable.
for the drain current versus the gate voltage at VD = 0.05 So far, the core model was mainly validated for long-channel
and 1 V and for temperatures between 273.15 and 373.15 K. multigates. Concerning short-channel devices, we expect that,
The subthreshold slope and the threshold voltage predicted by to some extent, the present model can inherit from some
the model are in good agreement with the measurements in the developments done for DG FinFETs [17], i.e., by using the
whole temperature range. For gate voltages close to 0 V, we potential minimum approach. However, for certain geometries
observe some mismatch between the model and the measure- such as TG and QG FETs, a more physical approach might be
ments, which is attributed to current leakage mechanisms that needed by considering corner effects and real 3-D topologies,
are not included in the model. as recently addressed in [22]. It is very likely that merging the
Most likely, at high temperature, the Io current is dominated work done in [22] with our core model will allow including
by channel leakage (in this case, the leakage current at the drain short channel effects while keeping a physically based model
is the same than the one at the source). However, several leak- with a minimum number of parameters.
70 IEEE TRANSACTIONS ON ELECTRON DEVICES, VOL. 59, NO. 1, JANUARY 2012

VII. C ONCLUSION [16] D. S. Jeon and D. E. Burk, MOSFET electron inversion layer
mobilitiesA physically based semi-empirical model for a wide tempera-
In this letter, we demonstrated how a multigate FET topology ture range, IEEE Trans. Electron Devices, vol. 36, no. 8, pp. 14561463,
having a common gate electrode could be merely considered as Aug. 1989.
[17] A. Yesayan, F. Prgaldiny, N. Chevillon, C. Lallement, and J.-M. Sallese,
a symmetric DG MOSFET through the definition of an equiv- Physics-based compact model for ultra-scaled FinFETs, Solid State
alent silicon thickness, an equivalent gate oxide capacitance, Electron., vol. 62, no. 1, pp. 165173, Aug. 2011.
and an equivalent channel width. All these transformations are [18] R. Quay, C. Moglestu, V. Palankovski, and S. Selberherr, A temperature
dependent model for the saturation velocity in semiconductor materials,
explicit and only rely on physical and technological parameters, Mater. Sci. Semicond. Process., vol. 3, no. 1/2, pp. 149155, Mar. 2000.
with no empirical relationships. The ability of the model to [19] G. Niu, J. D. Cressler, S. J. Mathew, and S. Subbanna, A channel resis-
predict charge densities and current up to 425 K confirms tance derivative method for effective channel length extraction in LDD
MOSFETs, IEEE Trans. Electron Devices, vol. 47, no. 3, pp. 648650,
the quite strong physical roots of this approach. In addition, Mar. 2000.
provided a temperature-dependent mobility was introduced, [20] J.-H. Chen, S.-C. Wong, and Y.-H. Wang, An analytic three-terminal
which is anyway required for real devices, the model was also band-to-band tunneling model on GIDL in MOSFET, IEEE Trans. Elec-
tron Devices, vol. 48, no. 7, pp. 14001405, Jul. 2001.
able to simulate measurements of a TG MOSFET at various [21] T.-E. Chang, C. Huang, and T. Wang, Mechanisms of interface trap-
temperatures. Based on these equivalence between planar DG induced drain leakage current in off-state n-MOSFETs, IEEE Trans.
and multigate FETs, any geometry can now be modeled with Electron Devices, vol. 42, no. 4, pp. 738743, Apr. 1995.
[22] R. Ritzenthaler, F. Lime, B. Iiguez, O. Faynot, and S. Cristoloveanu, 3-
a common formalism. Additional work is needed to take into D analytical modelling of subthreshold characteristics in Pi-gate FinFET
account short-channel effects and quantum corrections. transistors, in Proc. Solid-State Device Res. Conf., 2010, pp. 448451.

R EFERENCES
Nicolas Chevillon was born in Dijon, France, in
[1] B. Yu, H. Lu, M. Liu, and Y. Taur, Explicit continuous models for double- 1982. He received the M.S. degree in micro- and
gate and surrounding-gate MOSFETs, IEEE Trans. Electron Devices, nanoelectronics from the University of Strasbourg,
vol. 54, no. 10, pp. 27152722, Oct. 2007. Strasbourg, France, in 2008. He is currently working
[2] J.-M. Sallese, F. Krummenacher, F. Prgaldiny, C. Lallement, A. Roy, and toward the Ph.D. degree at the Institut dlectronique
C. Enz, A design oriented charge-based current model for symmetric du Solide et des Systmes, Centre National de la
DG MOSFET and its correlation with the EKV formalism, Solid State Recherche Scientifique, University of Strasbourg.
Electron., vol. 49, no. 3, pp. 485489, Mar. 2005. His current research interests include FinFET
[3] J.-P. Colinge, Multiple-gate SOI MOSFETs, Solid State Electron., compact modeling, 3-D simulations, and parameter
vol. 48, no. 6, pp. 897905, Jun. 2004. extraction.
[4] K. von Arnim, E. Augendre, A. C. Pacha, T. Schulz, K. T. San, F. Bauer,
A. Nackaerts, R. Rooyackers, T. Vandeweyer, B. Degroote, N. Collaert,
A. Dixit, R. Singanamalla, W. Xiong, A. Marshall, C. R. Cleavelin,
K. Schrufer, and M. Jurczak, Low-power multi-gate FET CMOS technol-
ogy with 13.9 ps inverter delay, large-scaled integrated high performance Jean-Michel Sallese received the M.Sc. degree from
digital circuits and SRAM, in VLSI Symp. Tech. Dig., 2007, pp. 106107. the Institut National des Sciences Appliques, Lyon,
[5] Intel Announcement for Microprocessor Production With 22 nm France, and the Ph.D. degree in physics from the
FinFET Technology. [Online]. Available: http://newsroom.intel.com/ University/CNRS of Nice Sophia Antipolis, Nice,
community/intel_newsroom/blog/2011/05/04/intel-reinvents-transistors- France, where he worked on deep levels character-
using-new-3-d-structure ization in semiconductors.
[6] B. Yu, J. Song, Y. Yuan, W.-Y. Lu, and Y. Taur, A unified analytic In 1991, he joined the Swiss Federal Institute of
drain-current model for multiple-gate MOSFETs, IEEE Trans. Electron Technology (cole Polytechnique Fdrale de Lau-
Devices, vol. 55, no. 8, pp. 21572163, Aug. 2008. sanne), Lausanne, Switzerland, where he was en-
[7] R. Ritzenthaler, F. Lime, B. Iiguez, E. Miranda, F. Martinez, F. Pascal, gaged in semiconductor laser diodes characterization
M. Valenza, O. Faynot, and S. Cristoloveanu, Analytical modeling of and modeling. He is currently giving lectures on
multiple-gate MOSFETs, in Proc. Spanish Conf. Electron Devices, 2011, advanced semiconductor devices as and his research activities focus on compact
pp. 14. modeling of multigate MOSFETs and modeling of microelectromechanical
[8] J.-M. Sallese, N. Chevillon, F. Prgaldiny, C. Lallement, and B. Iiguez, systems.
The equivalent-thickness concept for doped symmetric DG MOSFETs,
IEEE Trans. Electron Devices, vol. 57, no. 11, pp. 29172924, Nov. 2010.
[9] W. Xiong, J. W. Park, and J. P. Colinge, Corner effect in multiple-gate Christophe Lallement (M96) received the M.S.
SOI MOSFETs, in Proc. SOI Conf., 2003, pp. 111113. degree in engineering from Science University of
[10] Atlas/Silvaco Manual. [Online]. Available: www.silvaco.com Nancy I, Nancy, France, and the Ph.D. degree in
[11] K. E. Moselund, D. Bouvet, L. Tschuor, V. Pott, P. Dainesi, and engineering from cole Nationale Suprieure des
A. Ionescu, Local volume inversion and corner effects in triangular gate- Tlcommunications, Paris, France.
all-around MOSFETs, in Proc. Solid-State Device Res. Conf., 2006, From November 1994 to September 1997, he
pp. 359362. was a Postdoctoral Research Scientist with the Lab-
[12] B. Iguez, D. Jimnez, J. Roig, H. A. Hamid, L. F. Marsal, and J. Pallars, oratory of Electronics, Swiss Federal Institute of
Explicit continuous model for long-channel undoped surrounding gate Technology, Lausanne, Switzerland, working on the
MOSFETs, IEEE Trans. Electron Devices, vol. 52, no. 8, pp. 18681873, characterization and modeling of the MOSFET tran-
Aug. 2005. sistor in the development team of the EKV MOST
[13] P. L. Chambr, On the solution of the PoissonBoltzmann equation with model. In September 1997, he was an Associate Professor with the University
application to the theory of thermal explosions, J. Chem. Phys., vol. 20, of Strasbourg, Strasbourg, France, and the CNRS Laboratory for Physics and
no. 11, pp. 17951797, Nov. 1952. Applications of Semiconductors. Since September 2003, he has been a Profes-
[14] A. S. Roy, C. Enz, and J.-M. Sallese, Compact modeling of gate sidewall sor with the cole Nationale Suprieure de Physique de Strasbourg, Illkirch,
capacitance of DG-MOSFET, IEEE Trans. Electron Devices, vol. 53, France. His current research works, currently at the Institut dlectronique du
no. 10, pp. 26552657, Oct. 2006. Solide et des Systmes (InESS), focus on the study and modeling of advanced
[15] T. Ernst, R. Ritzenthaler, O. Faynot, and S. Cristoloveanu, A model of devices, mixed-signal systems with VHDL-AMS, and biosynthetic systems.
fringing fields in short-channel planar and triple-gate SOI MOSFETs, He is responsible for the group Heterogeneous systems and microsystems
IEEE Trans. Electron Devices, vol. 54, no. 6, pp. 13661375, Jun. 2007. at InESS.
CHEVILLON et al.: EQUIVALENT THICKNESS AND CAPACITANCE TO MOSFETs MODELING 71

Fabien Prgaldiny was born in France, in 1977. Josef Sedlmeir studied physics at the Technical Uni-
He received the M.S. and Ph.D. degrees in micro- versity, Munich, Germany, and received the Ph.D.
electronics from the University of Strasbourg (UdS), degree in condensed matter physics with nuclear
Strasbourg, France, in 2001 and 2003, respectively. methods, in 1992.
His doctoral research pertained to the modeling He worked in high energy physics (silicon de-
and simulation of deep-submicrometer MOSFETs. tectors) at Max-Planck-Institute, Munich/CERN, and
Since 2004, he has been an Associate Professor at Brookhaven National Laboratory, Upton, NY. In
with the cole Nationale Suprieure de Physique 1999, he joined Infineon Technologies, Munich, as
de Strasbourg, Illkirch, France, and the UdS, where a Device Characterization Engineer, working on the
he also joined the Institut dlectronique du Solide electrical characterization and compact modeling of
et des Systmes, Strasbourg, in 2005. His research advanced CMOS technologies. In February 2011, he
interests focus on compact modeling and simulation of a double-gate MOSFET, moved to Intel Mobile Communications, Neubiberg, Germany.
FinFET, and CNTFET. He is also interested in the use of the VHDL-AMS
hardware description language in compact modeling.

Morgan Madec was born in 1980. He received the Jasmin Aghassi received the diploma degree in
M.S. and Ph.D. degrees in microelectronics from the physics from Technical University of Aachen,
University Louis Pasteur (ULP), Strasbourg, France, Aachen, Germany, in 2004 and the Ph.D. degree in
in 2003 and 2006, respectively. theoretical condensed matter physics from the Uni-
From 2003 to 2006, he was with the Laboratoire versity of Karlsruhe, Karlsruhe, Germany, in 2007,
de Physique et Application des Semi-Conducteurs, where she worked on electronic transport in semi-
ULP Centre National de la Recherche Scientifique, conductor quantum dots.
Strasbourg, where he prepared a Ph.D. thesis on In November 2007, she joined Infineon Technolo-
the design and characterization of optical processors gies AG as a Research and Development Engineer,
in order to speed up image reconstruction in the working on advanced CMOS technologies. Her main
medical ?eld. He is currently an Associate Profes- fields of interests include compact modeling and
sor with the cole Nationale Suprieure de Physique de Strasbourg, Institut electrical characterization of submicron MOSFETs and quantum effects. Since
dlectronique du Solide et des Systmes, Universit de Strasbourg, Strasbourg, February 2011, she joined Intel Mobile Communications GmbH, Neubiberg,
where he teaches electronics. His research interests include compact modeling Germany, where she is now a Project Manager for CMOS technology platform
of integrated microsensors. development.