Electronics-I EE 231
EE-231
Chapter#1
Ch t #1
Semiconductor Diodes
Course Instructor:
Muhammad Sohail
Si 1.5 X 1010
Ge 2.5 X 1013
Relative mobility µn
Semiconductor µn (cm2/V-s)
Si 1500
Ge 3900
GaAs 8500
• Doping
p g involves in addingg dopant
p atoms to an intrinsic semiconductor.
• n-type materials: Doping Si with a Group V element, providing extra
electrons (n for negative) and moving the Fermi level up.
• pp-type
yp materials: Doping
p g Si with a Groupp III element,, providing
p g extra
holes (p for positive) and moving the Fermi level down.
Dopant
• Group V (n-type) –usually antimony(Sb),
arsenic(A),
i (A) phosphorus(P)
h h (P)
• Group III (p-type)-usually Boron(B) ,
Gallium (Ga) and Indium (In)
n-Type Material
Diffused impurities
with five valence
electron are called
donor atoms