The Relation between Hydrogen Desorption and the Surface Conditions of High
Purity Aluminium
E. P~,SZTOR
KFKI, Central Research Institute of Physics, H-1525 Budapest, P.O. Box 49 (Hungary)
Part.
pressure
IAr.unitl
Fig. 1. The quantity of outgassed hydrogen at 648 K: - - , untreated samples; - - - , implanted samples;
samples heat treated at 673 K for 20 rain.
37
Part. i
pcNsu~
/Ar.unit
Tisotk~.m
e_
etot lites which appear at temperatures over 623 K
tO. y 4~..41..~~,- . 4 - J" - g " m - Q
[8].
The straight lines fitted to the experimental
O.S, data are the basis for the calculations of
activation energy and pre-exponential factor
0.6-
Do.
It can be seen that the best degree of
linearity is achieved for magnesium-implanted
OA.
surface layers. There is also less scatter for the
chemically treated samples than for the un-
02" treated samples.
In Table 1 the diffusion coefficients, the
pre-exponential factors and the activation
t[se~x~ 2
energies for the untreated, the implanted and
Fig. 3. Desorption curves for untreated samples ( - - ) the chemically treated samples are listed.
and for implanted samples ( - - - ) (e/eto t is the inte- In the second series of experiments the
gral of the curve at a given time divided by the total structural changes in the oxide layers during
outgassed quantity characterized by the total integral heat treatment were studied. The oxidation of
of the curve): e, 723 K; m, 773 K; ×, 823 K.
unalloyed aluminium in vacuum {1.33 ×
10 -1 Pa) has been observed by Scamans and
diately put into the vacuum apparatus where Butler [11]. They carried out their in situ
the pumping was carried out. experiments in a high voltage electron micro-
In Fig. 4, plots of the hydrogen diffusion scope AEI EM7 HVEM operated at 500 kV.
coefficients D (calculated using a method de- For heat treatment below 748 K for 30 min,
scribed previously [2, 9] ) of the untreated, only the amorphous layer thickened. Above
the implanted and the chemically treated 748 K after 5 min crystalline oxides of
samples against temperature are shown. It can density 10 s cm -2 appeared and during
be seen that the position of the log D versus further heat treatment the crystallites grew to
1 / T curves changed owing to chemical treat- a maximum size of 100 nm. For heat treat-
ment and implantation. Because of implanta- ment at 793 K the maximum size of the
tion the magnesium particles presumably crystallites did not change; only their density
break through the oxide layer and disturb it. increased (6 × l0 s cm-2).
It is possible that magnesium changes into Our in situ experiments were carried out in
MgO [10] if the samples are heat treated; a JEOL JEM 200A electron microscope
then the hydrogen permeability of the oxide operated at 200 kV. The microscope vacuum
layer could be increased by the MgO crystal- (1.33 × 10-2 Pa) was used as the oxidation
38
~'A
~ ' ~ ~'~.
%..
x "\'~'N "~,,
%
. . . .
Fig. 4. The hydrogen diffusion coefficients of untreated samples (--m--), chemically treated samples ( - - o - - ) and
implanted samples ( - . - ~ - . - ) vs. temperature.
TABLE 1
The values of D O and Q for high purity hydrogen-enriched aluminium samples