INA
Outline
• Introduction and Some Basic Theory
- density of states, gain function
- dependence on dimensions
• Fabrication Technology
- molecular beam epitaxy and Stranski-Krastanov growth mode
- influence on geometry parameters
record
Spectral gain πq 2h 1 2
function g (E 21 ) = 2 hω
M T ( E 21 ) ρr ( E 21 )(f 2 − f1 ) = g max (E 21 ) ⋅ (f 2 − f1 )
nε0cm 0 21
n 2 1D E1
2m * L 1 E3
D( E ) = ∑ Θ( E − E i ) E2
i =1 h 2
π ⋅ E − E i
n
D ( E ) = ∑ α i ⋅ δ( E − E i ) D(E) 0D
i =1
with αi as degeneracy
(= 2 for s orbitals)
E1 E2 E3 E4 E
0D δ(p − pi ) δ(E − Ei )
dot i εi dot j εj
πq 2h 1 2 2 Γin / π
g (hω) = ∫ M ( h ω) P (ε, σ )[ f ( ε , E ) − f ( ε , E )] dε
nε 0cm 0 hω
T E c Fc v Fv
2
V0 (hω − ε) + Γin
2 2
QW µ = 1.24 eV to 1.40 eV QD
→ Variation of emission
wavelength
1 1
g th = α i + ln
L R1 R2
x k x k
Discrete energy levels: → high density of states, no temperature dependence
h
e- +
h
+ QW e- QDs
• Fabrication Technology
- molecular beam epitaxy and Stranski-Krastanov growth mode
- influence on geometry parameters
Negative Growth
• Desorption
Zero Growth
• Surface migration
• Interdiffusion
GaAs
.
pr
m
co
stress
InAs
tensile
GaAs
Quantum Dot
In As
In As
GaAs
∆E surf ~ x 2 (~ surface)
∆E strain ~ x 3 (~ volume)
Energy balance:
∆E = Cγx 2 − κε2C' x 3
γ = surface energie,
κ = elasticity module,
ε = strain coefficient
Preferential nu-
cleation of InAs
Aligned InAs Dot
Local Strain
InAs Dot
GaAs layer
• Fabrication Technology
- molecular beam epitaxy and Stranski-Krastanov growth mode
- influence on geometry parameters
• Electroluminescence at
77 K
• Nearly equidistant
transistion energies
→ Parabolic
potential shape
65 meV
T = 4K 100 nm
200 nm
norm. intensity
300 nm
reference
energy [eV]
• Broad emissions spectrum of a dot
ensemble due to size fluctuations • Single line by dot selection
inhomogeneously
broadend gain
function
homogeneously Energy
broadend ensemble gain
n-contact
detector
• Fundamental transition
saturates and higher
order transitions
contribute to the gain
• maximum gain of
17 - 20 cm-1
(6 dot layers stack)
suprisingly low modal gain of 3 cm-1
per dot layer QD Laser, Tutorial, Lund
INA Reithmaier, 29.6.2007 30
Auger Effect in Different Types of QDs
• Hydrostatic pressure measure-
ments show very different beha-
vior of 980 nm and 1.3 µm QD
lasers.
• Ith(980 nm) increases with p and
Elas with p2 as expected for
radiative recombination
• Ith(1.3 µm) decreases by 26 %
with p while Elas increases.
1 1
Threshold gain : g th = αi + ln
L R1R 2
• Fabrication Technology
- molecular beam epitaxy and Stranski-Krastanov growth mode
- influence on geometry parameters
Absorption(a.u.)
0,6
consumption. 6 nm
0,5
• Strong cost reduction possible by 0,4 60 nm
passive cooling 0,3
7
FBH 100 µm
Ferdinand-Braun-Institut
für Höchstfrequenztechnik 6 T = 15°C
5 100 µm;
• Epi-side down mounted devices
optical power P / W
T = 25°C
mounted on heat sink 4 50 µm
• Pmax = 4.3 W (6.3 W) for 50 µm (100 T = 15°C
50 µm
µm) stripe width in cw 3 T = 25°C
FBH 3500
Ferdinand-Braun-Institut
für Höchstfrequenztechnik 3000 2W
2500
current I / mA
• Epi-side down 1.5 W
2000
mounted devices 011611
1500 1 W 011612
• 1 mm long, 70 µm
1000 011613
wide stripes 011614
500 011615
• 2300 h without
failures 0
0 500 1000 1500 2000
• > 1000 h at 2 W Aging time t / h
(≈ 30 mW/µm)
2.5 mm
QW at 600 mA 0.36 nm/K
1000 QD1 at 1200 mA 0.107 nm/K
990
wavelength (nm)
985
• Very low temperature
dependence for QD
lasers 980
• Between 20 – 80°C
QW: ∆λ = 22 nm
975
QD: ∆λ < 6 nm 20 30 40 50 60 70 80
temperature (°C)
S.C. Auzanneau et al., APL 84, 2238 (2004)
QD Laser, Tutorial, Lund
INA Reithmaier, 29.6.2007 37
High Power Measurement Data of 920 nm QD Lasers
As-cleaved device,
Wall-plug efficiency of 55 % at 1.5 W
1 mm long, 100 µm wide
Pulsed operation
• Tmax > 140 °C
• High T0 of 162 K
up to 40 °C and
> 150K up to 60°C
current (A)
3 mm
tapered laser
• Fabrication Technology
- molecular beam epitaxy and Stranski-Krastanov growth mode
- influence on geometry parameters
w = 20 nm
50 nm
T=8 K
• Deposition
from 0.8-3.1 MLs (A-E)
→ wavelength
shift > 500 nm
Wavelength (nm)
Intensity (normal.)
1 1.1
1200
Energy (eV)
0.8 1.0
0.6 FWHM 0.9 1400
= 92 nm
0.4 0.8 1600
0.2 0.7 PL (8K) 1800
0 0.6 2000
0.75 0.8 0.85 0.9 0 0.5 1 1.5 2 2.5 3
Energy (eV) Nominal Layer Thickness (nm)
10
DFB laser with Cr
as cleaved facet
gratings
8 10
T = 20 °C
5 0
intensity (dB)
I = 70 mA
-10 cw
HR facet output power (mW) -20 SMSR
6 -30 48 dB
-40
-50
0
0 -60
20 40 60 80 1.48 1.49 1.5 1.51 1.52
current (mA) 4 wavelength (µm)
cw, L = 600 µm
0
0 20 40 60 80
drive current (mA) QD Laser, Tutorial, Lund
INA Reithmaier, 29.6.2007 49
• Introduction and Some Basic Theory
- density of states, gain function
- dependence on dimensions
• Fabrication Technology
- molecular beam epitaxy and Stranski-Krastanov growth mode
- influence on geometry parameters
gain (dB)
Technion 15
AR 10
coatings
W 0
L=2.5mm 1.45 1.47 1.49 1.51 1.53 1.55 1.57 1.59 1.61
wavelength (µm)
-10
log10(BER)
-20
50 nm
-5
-30
-6
-40
-7
-50 Converted signal
2.5 GBit/s at λc=1525 nm
-60 -8
1500 1550 1600 PRB
Wavelength (nm)
-9
-34 -32 -30 -28 -26
Pin (dBm)
• About 5 dB penalty due to additional noise of amplifier and set-up
• 50 nm wavelength conversion with 2.5 Gbit/s (open eye diagram)
• BER identical between modulated and converted signal
ER 6.3 ER 6.2
Q 4.15 Q 4.5
ER 6.1 ER 5.9
Q 5.0 10 ps/div. Q 5.3
Pinsat -2 filling
-150
• Broad band intensity
-3 noise suppression
-155 Pinsat
10 Pinsat
over hundreds of
-4 GHz !
-160
10 Pinsat
-5
-5 -2.5 0 2.5 5 -500 -250 0 250 500
Frequency [THz] Frequency [GHz]
-2 100
75 mA Slow recovery
Experiment
-4 100 mA
Bi-exponential fit 3
-6 2 Fast recovery
150 mA
λ = 1523 nm 1
-8
0
-2 0 2 4 6 8 20 40 60 80 100 1475 1500 1525 1550 1575 1600
Delay (ps) Wavelength (nm)
τ1 τ3
M. Van der Poel et al., APL 89 (8), 081102 (2006) QD Laser, Tutorial, Lund
INA Reithmaier, 29.6.2007 56
Summary
• Theoretical Background of Low Dimensional Systems
- Strong influence of dimensionality on gain properties
- Additional geometry parameters can be used for spectral gain
engineering and tailoring of new material properties
• Fabrication Technology of Dot-Like Structures
- Self-assembly techniques driven by material strain
- Geometry parameters (density, size, size distribution) can be
controlled by growth parameters
• High power QD lasers
- BA laser: 6.3 W (980 nm), 3 W (920 nm) output power, ηw = 55 %
- Tapered laser: 3 W cw single lobe output power, ηw = 39%
- Internal temperature compensation by dot tailoring
(BA laser: dλ/dT = 0.11 nm/K, T laser: dλ/dT = 0.07 nm/K)
• 1.55 µm QD Lasers and SOAs
- ultra-broad band gain material (> 300 nm) for telecom laser appl.
- 10 GBit/s multi-wavelength amplification
- 40 GBit/s pattern free signal amplification and recovery
QD Laser, Tutorial, Lund
INA Reithmaier, 29.6.2007 57
Acknowledgements
Thales R & T
Technion
Technion
DTU•COM
Universidad
Politécnica de
Universidad Politécnica
Madrid de Madrid
Politecnico di Torino
QD Laser, Tutorial, Lund
INA Reithmaier, 29.6.2007 58