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ESE-505 Semiconductor

Materials and
Technology
Class 02

Course Contents
Theory of solid-state physics to give
basic information necessary to
understand device physics;

PN junction operation;
Schottky-barrier contacts;
ohmic contacts
Hetrojuntion

Course Contents

BJT operation,
forward current,
base recombination current,
uniform and non-uniform doping,
planar BJT structures,
limitations of simple analytical BJT
models;

Course Contents

quantum wires,
quantum dots,
resonant tunneling diodes,
charge coupled devices;

Course Contents
Fabrication techniques of
semiconductor devices:
fundamental principles of "front-end"
processes used in the fabrication of
devices for silicon integrated circuits

Course Contents
advanced physical models and
practical aspects of major processes
such as oxidation,
diffusion,
ion implantation, and
epitaxy;
issues in modern device scaling

What is Semiconductor
Conductivity between conductor and
insulator
Conductivity can be controlled by
dopant
Silicon and germanium
Compound semiconductors
SiGe, SiC
GaAs, InP, etc.
Hong Xiao, Ph. D.

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Periodic Table
of the Elements

Hong Xiao, Ph. D.

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Semiconductor Substrate and


Dopants
Substrat
e
P-type
Dopan
t

Hong Xiao, Ph. D.

N-type
Dopants

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Orbital and Energy Band Structure


of an Atom
Valence shells
Conducting band, Ec

Nuclei

Band gap, Eg

Valence band, Ev

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Band Gap and Resistivity

Eg = 1.1 eV

Eg = 8 eV

Aluminum

Sodium

Silicon

Silicon dioxide

2.7 cm

4.7 cm

~ 1010 cm

> 1020 cm

Conducto
rs

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Semiconduc
tor

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Insulat
or
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Crystal Structure of Single Crystal


Silicon
Shared electrons

Si
Si

Si

Si

Si

Si

Si

Si

Si

Si
Si
Si
Si

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Si

12

Why Silicon
Abundant, inexpensive
Thermal stability
Silicon dioxide is a strong
dielectric and relatively easy to
form
Silicon dioxide can be used as
diffusion doping mask
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13

N-type (Arsenic) Doped Silicon


and Its Donor Energy Band

Si

Conducting band, Ec

Si

Si

Extra

Ed ~ 0.05 eV

Electron

Si

As

Si

Si

Si

Eg = 1.1 eV

Si
Valence band, Ev

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14

P-type (Boron) Doped Silicon


and Its Donor Energy Band
Conducting band, Ec

Si

Si

Si
Hole

Si

Eg = 1.1 eV

Si

Ea ~ 0.05 eV

Si

Si

Si
Electron

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Valence band, Ev

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15

Dopant Concentration and


Resistivity
Resistivity
P-type, Boron

N-type,
Phosphorus

Dopant concentration
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Dopant Concentration and


Resistivity
Higher dopant concentration, more
carriers (electrons or holes)
Higher conductivity, lower resistivity
Electrons move faster than holes
N-type silicon has lower resistivity
than p-type silicon at the same
dopant concentration
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Basic Devices

Hong Xiao, Ph. D.

Resistor
Capacitor
Diode
Bipolar Transistor
MOS Transistor

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Resistor

h
w

l
R
wh
: Resistivity
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Resistor
Resistors are made by doped silicon
or polysilicon on an IC chip
Resistance is determined by length,
line width, height, and dopant
concentration

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Capacitor
s

hl
C
d
: Dielectric
Constant

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21

Capacitors
Charge storage device
Memory Devices, esp. DRAM
Challenge: reduce capacitor size
while keeping the capacitance
High- dielectric materials

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Capacitors
Dielectric Layer
Dielectric
Layer

Poly Si
Oxide
Si

Poly 2
Poly
Si

Si

Poly 1
Heavily
Doped Si

Parallel
plate
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Stack
ed

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Deep
Trench
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Metal Interconnection and RC


Delay
Dielectric,

Metal,
I

d
w

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Diode

P-N Junction
Allows electric current go through
only when it is positively biased.

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25

Diode
V1

V2
P1

V1 > V2 ,

current

V1 < V2 ,

no current

Hong Xiao, Ph. D.

P1 > P2 ,

P2

current

P1 < P2, no current

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Figure 3.14
Transition region

Vp
Hong Xiao, Ph. D.

+
+
+
+
+

+
+
+
+
+

V0
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Vn

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I-V Curve of Diode

-I

V
0

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Bipolar Transistor

Hong Xiao, Ph. D.

PNP or NPN
Switch
Amplifier
Analog circuit
Fast, high power
device
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29

NPN and PNP Transistors


E

E
N

C
N

C
C

E
B

C
P

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30

MOS Transistor
Metal-oxide-semiconductor
Also called MOSFET (MOS Field Effect
Transistor)
Simple, symmetric structure
Switch, good for digital, logic circuit
Most commonly used devices in the
semiconductor industry

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NMOS Device
Basic Structure

VG

VD
VG

Metal Gate
Ground

n+
Source

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p-Si

VD

n+
Drain

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MOSFET

Hong Xiao, Ph. D.

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Basic Circuits

Hong Xiao, Ph. D.

Bipolar
PMOS
NMOS
CMOS
BiCMOS

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Market of Semiconductor Products


Compound
100%

Bipolar

50%
MOSFET

1980
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1990
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4%
8%

88%

2000

35

Bipolar IC
Earliest IC chip
1961, four bipolar transistors,
$150.00
Market share reducing rapidly
Still used for analog systems and
power devices
TV, VCR, Cellar phone, etc.

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36

CMOS Inverter
Vdd
PMOS
V in

Vout
NMOS
Vss

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IC Chips
Memory
Microprocessor
Application specific IC (ASIC)

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CMOS
In the 1980s MOSFET IC surpassed
bipolar
LCD replaced LED
Power consumption of circuit
CMOS replaced NMOS
Still dominates the IC market
Backbone of information revolution
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Advantages of CMOS
Low power consumption
High temperature stability
High noise immunity

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40

CMOS Inverter, Its Logic Symbol and


Logic Table

Vdd

Vin

Vout

PMOS
Vin

Vout
NMOS
Vss

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In

Out

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41

Summary
Semiconductors are the materials
with conductivity between conductor
and insulator
Its conductivity can be controlled by
dopant concentration and applied
voltage
Silicon, germanium, and gallium
arsenate
Silicon most popular: abundant and
stable oxide
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Summary
Boron doped semiconductor is p-type,
majority carriers are holes
P, As, or Sb doped semiconductor is ptype, the majority carriers are electrons
Higher dopant concentration, lower
resistivity
At the same dopant concentration, ntype has lower resistivity than p-type
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43

Basic Building Blocks of Semiconductor Devices

(a) M-S Junction (b) P-N Junction (c) Heterojuction (d)


MOS structure

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The P-N Diode --- Under Biasing Conditions

Current-voltage characteristics
of a typical Si p-n junction
(a) Thermal
equilibrium
(b) Forward-bias
condition.
(c) Reverse-bias

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Classification of Semiconductor Devices

Bipolar Devices

Unipolar Devices

P-N Junction Diode


Bipolar Junction Transistor (BJT)
Heterojunction Bipolar Transistor (HBT)
Thyristor and related power devices
Schottky-barrier diode (SBD)
Junction Field Effect Transistor (JFET)
Metal-Oxide-Semiconductor FET (MOSFET)
MOS Diode (Capacitor)
Complementary MOS (CMOS) BiMOS and BiCMOS
Power MOS

High-Speed Devices

Metal-Semiconductor FET (MESFET)


Modulation-Doped FET (MODFET), High-Electron-Mobility Transistor (HEMT)

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Semiconductor Devices (continued)

Microwave Devices

Tunnel diode
IMPATT diode
Transferred-Electron Device (TED)
Quantum-Effect Devices
Hot-Electron Devices

Photonic Devices

Light Emitting Diode (LED)


Semiconductor Laser (Laser Diode, LD)
Photodetector

Photodiode (PD), Avalanche Photodiode (APD)


Phototransistor (PT)

Solar Cell
Display Devices

Thin-Film Transistor LCD (TFT-LCD)


Organic Electroluminescence Display (OELD) or Organic Light Emitting Diode (OLED)

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Semiconductor Devices (continued)

Integrated Devices
Passive Components
IC Resistor, IC Capacitor, IC Inductor

MOS Menory

Dynamic Random Access Memory (DRAM)


Static Random Access Memory (SRAM)
Nonvolatile Memory
Erasable-Programmable Read-Only Memory (EPROM)
Electrically Erasable-Programmable Read-Only Memory (EEPROM)
Flash Memory
Single-Electron Memory

MEMS devices

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The Bipolar Junction Transistor (BJT)

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The MOSFET

50

MESFET

Schottky
Contact

Ohmic Contact

Mesa Structure

To minimize parasitic
capacitances

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MODFET
Modulation Doped FET
A thin undoped well
bounded by two wider
bandgap doped barrier

HFET (Heterojunction FET)


2DEG FET or TEGFET,
SEDFET (Separately Doped
FET)
Advantages:
Extremely high cutoff
frequency and fast access
time

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THE END

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