Unggahan by Ramani Chandran

1-s2.0-S016943321502067X-main

Mixed-mode High-power Impulse Magnetron Sputter Deposition of Tetrahedral Amorphous Carbon With Pulse-length Control of Ionization

Wet Surfaces

Surface Wetting

André 1 - Controlling Ion Fluxes During Reactive Sputter-Deposition of SnO2-F

André 2 -A Plasma Lens for Magnetron Sputtering

Shades' Paper on glow discharge

Temporal Evolution of the Ion Fluxes f

High Power Impulse Magnetron Sputtering

Encoding Active Device Elements at Nanowire Tips

Inquiry Based Teaching Test Schores

Introduction to Chemical equations

semi.doc

Semi

Semiconductor band thoery

Wang Et Al 2012 ChemCatChem

Rational Band Gap Engineering of WO3 Photocatalyst for Visible light Water Splitting

Evaporation-Assisted High-power Impulse Magnetron Sputtering

Self-Diffusion in Amorphous Silicon

Memristor concept with basic introductory physics

Ion Composition in HiPIMS

Time-Resolved Ionisation Studies of TheHigh Power Impulse Magnetron Dischargein Mixed Argon and Nitrogen Atmosphere

Ionisation Studies of HiPIMS

Plasma Electronegativity

DAAD UA MOU December 2014

Titanium Oxide Thin Films

Effect of Intrinsic Stress

High Power density of deposition system

Micro structure engineering

Deposition of Rutile (TiO2) With Preferred Orientation by Assisted High Power Impulse Magnetron Sputtering

1 Hf Based High-k Dieelctrics

Wentzel and Erdley

Damon Stages of Friendship

Damon Self‐Understanding

Damon - Infancy to Adelocance

Damon - Infancy to Adelocance

Entanglement Loss in coding research

Design Optimization of Cryptography

Conference Receipt

Good Book

Making medical quality carbon films

Palmucci 2013 Journal of Physics D Applied Physics

Mishra 2009 Plasma Processes and Polymers

Hecimovic 2010 Journal of Applied Physics

05556014

06525366

Unit Guide 2013 ASTR178 S2 Day

mobile_message_2000-01-22_11-00_AM

mobile_message_2000-01-22_11-00_AM